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China Silicon Carbide Manufacturer, Supplier, Factory

The corporation upholds the philosophy of ""Be No.1 in excellent, be rooted on credit rating and trustworthiness for growth"", will proceed to provide aged and new buyers from home and abroad whole-heatedly for Silicon Carbide, Hot-Press Furnace, Warmly welcome to cooperate and develop with us! we will continue to provide product with high quality and competitive price.
Silicon Carbide, With high quality, reasonable price, on-time delivery and customized & personalized services to help customers achieve their goals successfully, our company has got praise in both domestic and foreign markets. Buyers are welcome to contact us.

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  • Porous SiC Ceramic Chuck

    Porous SiC Ceramic Chuck

    Vetek Semiconductor offers Porous SiC Ceramic Chuck widely used in wafer processing technology, transfer and other links, suitable for bonding, scribing, patch, polishing and other links, laser processing. Our Porous SiC Ceramic Chuck has Ultra-strong vacuum adsorption, high flatness and high purity meet the needs of most semiconductor industries.Welcome to inquiry us.
  • EDM graphite electrode

    EDM graphite electrode

    EDM graphite electrode has the characteristics of moderate density, smooth surface and low cost, and is suitable for chemical industry, metal smelting, etc. VeTek Semiconductor has strong production capacity and rich export experience in EDM graphite electrode products. You are welcome to inquire at any time.
  • Wafer Lift Pin

    Wafer Lift Pin

    VeTek Semiconductor is a leading EPI Wafer Lift Pin manufacturer and innovator in China.We have been specialized in SiC coating on surface of graphite for many years. We offer a EPI Wafer Lift Pin for Epi process. With high quality and competitive price,we welcome you to visit our factory in China.
  • High-Purity Opaque Quartz Shield & Shutter For MOCVD

    High-Purity Opaque Quartz Shield & Shutter For MOCVD

    The high-temperature and chemically reactive environments of MOCVD, the protection of the reaction chamber and the precision of process control are paramount. VETEK provides premium Opaque (Milky White) Quartz components, specifically designed to act as the "cleanroom" and "precision gate" within your semiconductor equipment. These components offer a cost-effective yet high-performance solution for managing thermal radiation and preventing contamination.
  • Aluminum Nitride ceramic Disc

    Aluminum Nitride ceramic Disc

    Vetek Semiconductor aluminum nitride ceramics disc is a high-performance material known for its excellent properties of high thermal conductivity & electrical insulation, especially suitable for demanding electrical applications. Aluminum nitride ceramic discs are stable at high temperatures in a variety of inert environments. Welcome to communicate with us.
  • CVD SiC Block for SiC Crystal Growth

    CVD SiC Block for SiC Crystal Growth

    CVD SiC Block for SiC Crystal Growth, is a new high purity raw material developed by Vetek Semiconductor. It has a high input-output ratio and can grow high-quality, large-size silicon carbide single crystals, which is a second-generation material to replace the powder used in the market today. Welcome to discuss technical issues.

  • Different technical routes of SiC epitaxial growth furnace

    Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

  • 8-inch SiC epitaxial furnace and homoepitaxial process research

    8-inch SiC epitaxial furnace and homoepitaxial process research

  • Principles and Technology of Physical Vapor Deposition (PVD) Coating (2/2) - VeTek Semiconductor

    Electron beam evaporation is a highly efficient and widely used coating method compared to resistance heating, which heats the evaporation material with an electron beam, causing it to vaporize and condense into a thin film.

  • What is High-purity porous graphite?

    What is High-purity porous graphite ? - Vetek , This blog mainly introduces the specific working principle of High-purity porous graphite for SiC single crystal growth by PVT method.

  • Aixtron G10 Components: Key Parts for High-Performance SiC Epitaxy

    Take a look at key Aixtron G10 Components for high-temp SiC epitaxy systems. We cover CVD SiC coated graphite parts, TaC coating components, and thermal field structures – and how they help with process stability, purity control, and wafer yield in advanced semiconductor manufacturing.

  • What is the difference between CVD TaC and sintered TaC?

    This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

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