Web Menu

Product Search

Language

Products

China High Pure Silicon Carbide Wafer Carrier Manufacturer, Supplier, Factory

The key to our success is "Good Products Good quality, Reasonable Price and Efficient Service" for High Pure Silicon Carbide Wafer Carrier, Epi wafer holder, SiC coating wafer holder, SiC coating wafer carrier, wafer carrier, In order to expand our international market, we mainly supply our oversea customers Top quality performance products and service.
High Pure Silicon Carbide Wafer Carrier, Based on our guiding principle of quality is the key to development, we continually strive to exceed our customers' expectations. As such, we sincerely invite all interested companies to contact us for future cooperation, We welcome old and new customers to hold hands together for exploring and developing; For more information, please feel free to contact us. Thanks. Advanced equipment, strict quality control, customer-orientation service, initiative summary and improvement of defects and extensive industry experience enable us to guarantee more customer satisfaction and reputation which, in return, brings us more orders and benefits. If you are interested in any of our products, please feel free to contact us. Inquiry or visit to our company are warmly welcome. We sincerely hope to start a win-win and friendly partnership with you. You can see more details in our website.

Related Products

Hot Products

  • CVD SiC Coating Nozzle

    CVD SiC Coating Nozzle

    CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications. Welcome your further inquiry.
  • Pre-Heat Ring

    Pre-Heat Ring

    Pre-heat ring is used in the semiconductor epitaxy process to preheat wafers and make the temperature of wafers more stable and uniform, which is of great significance for the high-quality growth of epitaxy layers. Vetek Semiconductor strictly controls the purity of this product to prevent volatilization of impurities at high temperatures.Welcome to have a further discussion with us.
  • Quartz Wafer Boat

    Quartz Wafer Boat

    Vetek Semiconductor Quartz Wafer Boat is designed to exceed industry standards and optimize your production process. Our quartz wafer boats are carefully designed and highly reliable to meet the stringent requirements of the semiconductor industry. We look forward to your consultation.
  • CVD TaC Coating Cover

    CVD TaC Coating Cover

    CVD TaC coating cover provided by VeTek Semiconductor is a highly specialized component designed specifically for demanding applications. With its advanced features and exceptional performance, our CVD TaC coating cover offers several key advantages.Our CVD TaC coating cover provides the necessary protection and performance required for success.We looking forward to exploring potential cooperation with you!
  • Silicon Carbide wafer Carrier

    Silicon Carbide wafer Carrier

    As a professional Silicon Carbide wafer carrier supplier in China, VeTek Semiconductor SiC wafer carrier is a tool specially used for handling and processing semiconductor wafers, which plays an irreplaceable role in the semiconductor wafer process. Welcome to your further consultation.
  • Tantalum Carbide Coated Chuck

    Tantalum Carbide Coated Chuck

    VeTek Semiconductor is a leading Tantalum Carbide Coated Chuck manufacturer and innovator in China.We have been specialized in TaC coating for many years.Our products have a high purity and high temperature resistance up to 2000℃.We look forward to becoming your long-term partner in China.Welcome to consult at any time.

  • Veteksemicon shines at the 2025 Shanghai SEMICON International Exhibition

    Veteksemicon shines at 2025 Shanghai SEMICON International Exhibition, leading the future of semiconductor industry with innovative technologies

  • Uses of solid silicon carbide

    Solid silicon carbide (SiC) has become one of the key materials in semiconductor manufacturing due to its unique physical properties. The following is an analysis of its advantages and practical value based on its physical properties and its specific applications in semiconductor equipment (such as wafer carriers, shower heads, etching focus rings, etc.).

  • Still worried about material performance in high-temperature environments?

    Having worked in the semiconductor industry for over a decade, I understand firsthand how challenging material selection can be in high-temperature, high-power environments. It wasn't until I encountered VETEK's SiC Block that I finally found a truly reliable solution.

  • Research on SIC Wafer Carrier Technology

    ​SiC wafer carriers, as key consumables in the third-generation semiconductor industry chain, their technical characteristics directly affect the yield of epitaxial growth and device manufacturing. With the surging demand for high-voltage and high-temperature devices in industries such as 5G base stations and new energy vehicles, the research and application of SiC wafer carriers are now facing significant development opportunities.

  • Based on 8-inch silicon carbide single crystal growth furnace technology

    Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

  • The challenges of silicon carbide crystal growth furnaces

    Silicon carbide (SiC) crystal growth furnaces play a vital role in producing high-performance Sic wafers for next-generation semiconductor devices. However, the process of growing high-quality SiC crystals presents significant challenges. From managing extreme thermal gradients to reducing crystal defects, ensuring uniform growth, and controlling production costs, each step requires advanced engineering solutions. This article will analyze the technical challenges of SIC crystal growth furnaces from multiple perspectives.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept