Products

Diamond–Aluminum Composite is an advanced metal matrix composite that combines the excellent thermal conductivity of diamond with the lightweight characteristics of aluminum. By incorporating diamond particles into an aluminum or aluminum alloy matrix, the material delivers high thermal conductivity, adjustable thermal expansion, and a favorable balance between thermal performance and weight.

Diamond–silicon carbide (Diamond/SiC) composite combines the high thermal conductivity of diamond with the structural stability and hardness of silicon carbide. Depending on composition and manufacturing route, it can be designed for efficient heat transfer, controlled thermal expansion and precision thermal-management components.

Dry plasma etch chambers rely on precise boundary control around the wafer to keep plasma density, gas flow, and electric-field distribution stable. VeTek Semiconductor High Purity Quartz Etch Rings are semiconductor-grade chamber components made from dehydroxylated fused quartz. They define the process zone at the wafer edge, help confine plasma, smooth gas flow, and protect the wafer periphery—supporting more uniform etch rates and cleaner profiles across 2–12 inch silicon, SiC, GaN, and sapphire wafers.

VeTek Semiconductor’s High Purity Quartz Wafer Carriers are precision-engineered semiconductor-grade fixtures for stable wafer handling in high-temperature thermal processing, thin-film deposition, wet processes, and vacuum applications. Manufactured from semiconductor-grade dehydroxylated fused quartz (JGS2 equivalent), these wafer carriers deliver ultra-high purity, excellent thermal shock resistance, chemical inertness, low outgassing, and high flatness—ensuring reliable, contamination-free support for 2–12 inch silicon, SiC, GaN, and sapphire substrates.

VeTek Semiconductor supplies high-quality Aluminum Nitride (AlN) single-crystal wafers and substrates for next-generation ultra-wide-bandgap semiconductor devices. With an ultra-wide bandgap of approximately 6.2 eV, outstanding thermal conductivity, exceptional electrical insulation, and excellent lattice and thermal-expansion match with GaN, AlN wafers are ideal for high-power RF devices, high-voltage power electronics, and deep-ultraviolet (DUV) optoelectronics.

VeTek Semiconductor’s high-purity quartz furnace tubes are core process chamber components for semiconductor thermal processing equipment. Manufactured from semiconductor-grade dehydroxylated fused quartz, these tubes serve as the sealed reaction cavity in oxidation furnaces, diffusion furnaces, annealing furnaces, and LPCVD systems. They deliver exceptional purity, thermal stability, and chemical resistance, ensuring uniform temperature fields, stable gas flow, and ultra-low contamination for 4/6/8/12-inch wafer processing.