Products

VeTek is a professional manufacturer and supplier in China. Our factory provides Carbon Fiber, Silicon Carbide Ceramics, Silicon Carbide Epitaxy, etc. If you are interested in our products, you can inquire now, and we will get back to you promptly.
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SiC Cantilever Paddles

SiC Cantilever Paddles

Veteksemicon SiC Cantilever Paddles are high-purity silicon carbide support arms designed for wafer handling in horizontal diffusion furnaces and epitaxial reactors. With exceptional thermal conductivity, corrosion resistance, and mechanical strength, these paddles ensure stability and cleanliness in demanding semiconductor environments. Available in custom sizes and optimized for long service life.
SiC Block

SiC Block

Veteksemicon’s SiC Block is designed for high-efficiency grinding and thinning of silicon and sapphire wafers. With excellent thermal conductivity (≥120 W/m·K), high thermal shock resistance, and superior wear resistance (Mohs ≥9), our blocks improve process stability and reduce tool change frequency. Available in sizes from 120mm to 480mm, with customized options and fast delivery to meet diverse production needs.
Silicon Carbide Coating Wafer Holder

Silicon Carbide Coating Wafer Holder

The Silicon Carbide Coating Wafer Holder by Veteksemicon is engineered for precision and performance in advanced semiconductor processes such as MOCVD, LPCVD, and high-temperature annealing. With a uniform CVD SiC coating, this wafer holder ensures exceptional thermal conductivity, chemical inertness, and mechanical strength — essential for contamination-free, high-yield wafer processing.
SiC Edge Ring

SiC Edge Ring

Veteksemicon High-purity SiC edge rings, specially designed for semiconductor etching equipment, feature outstanding corrosion resistance and thermal stability, significantly enhancing wafer yield
SiC Ceramics Membrane

SiC Ceramics Membrane

Veteksemicon SiC ceramics membranes are a type of inorganic membrane and belong to solid membrane materials in membrane separation technology. SiC membranes are fired at a temperature above 2000℃. The surface of the particles is smooth and round. There are no closed pores or channels in the support layer and each layer. They are usually composed of three layers with different pore sizes.
CMP Polishing Slurry

CMP Polishing Slurry

CMP polishing slurry (Chemical Mechanical Polishing Slurry) is a high-performance material used in semiconductor manufacturing and precision material processing. Its core function is to achieve fine flatness and polishing of the material surface under the synergistic effect of chemical corrosion and mechanical grinding to meet the flatness and surface quality requirements at the nano level. Looking forward to your further consultation.
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