Products

VeTek Semiconductor’s high-purity quartz furnace tubes are core process chamber components for semiconductor thermal processing equipment. Manufactured from semiconductor-grade dehydroxylated fused quartz, these tubes serve as the sealed reaction cavity in oxidation furnaces, diffusion furnaces, annealing furnaces, and LPCVD systems. They deliver exceptional purity, thermal stability, and chemical resistance, ensuring uniform temperature fields, stable gas flow, and ultra-low contamination for 4/6/8/12-inch wafer processing.

VeTek Semiconductor’s Solid SiC accessories for the Aixtron G10-SiC platform are high-purity, fully dense silicon carbide components designed for the demanding thermal and chemical environment of SiC epitaxial growth. These parts deliver outstanding high-temperature stability, chemical resistance, and ultra-low particle generation, supporting the high-throughput 9×150 mm / 6×200 mm planetary reactor configuration used in power device manufacturing.

VETEK Professional Cleaning Service for CVD SiC Coated Graphite Parts is a specialized technical service designed for Aixtron / Veeco MOCVD equipment susceptors and graphite components used in GaN / AlN / AlGaN epitaxial processes. Our proprietary cleaning process thoroughly eliminates surface memory effect, restores stable gas flow in the reactor, and strictly protects the 100 µm CVD SiC coating with absolute zero thickness loss and zero metal residue.

VETEK CVD SiC Coated Graphite Susceptor for Wafer Carrier is a high-performance wafer support component designed for semiconductor epitaxy processes. The product uses high-purity graphite as the substrate and is coated with a uniform CVD silicon carbide (SiC) layer, providing excellent thermal stability, chemical resistance, and particle control. As a critical graphite susceptor component, it directly supports wafers inside the reaction chamber and helps maintain uniform temperature distribution and stable epitaxial growth conditions.

VeTek Semiconductor delivers premium-grade High Purity Silicon Carbide (SiC) Powder tailored specifically for high-yield SiC Crystal Growth (PVT process), semiconductor substrate production, and advanced functional ceramics. Processed through ultra-clean purification technology, our high purity SiC raw material provides exceptionally low trace metal levels, reproducible sublimation performance, and highly consistent batch-to-batch quality to meet rigorous semiconductor manufacturing requirements.

VETEK High Purity Quartz Wafer Boat for TEL semiconductor equipment is manufactured from semiconductor-grade quartz material and designed for wafer handling in high-temperature processes such as diffusion, oxidation, annealing, and CVD. With excellent thermal stability, chemical resistance, and low contamination characteristics, it provides reliable wafer support for semiconductor manufacturing applications.