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Products

VeTek is a professional manufacturer and supplier in China. Our factory provides Carbon Fiber, Silicon Carbide Ceramics, Silicon Carbide Epitaxy, etc. If you are interested in our products, you can inquire now, and we will get back to you promptly.
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Porous Tantalum Carbide (TaC) Coated Graphite Ring

Porous Tantalum Carbide (TaC) Coated Graphite Ring

The VETEK Porous TaC Coated Graphite Ring is a thermal field component engineered for SiC single crystal growth via the PVT (Physical Vapor Transport) process. It is produced from high-purity porous graphite and coated with tantalum carbide (TaC) using CVD technology. The design targets high-temperature stability, chemical resilience, and controlled thermal field performance. By minimizing contamination and supporting process consistency, this component contributes to reproducible SiC crystal growth outcomes.
CVD Silicon Carbide (SiC) Coated Graphite RTP RTA Carrier

CVD Silicon Carbide (SiC) Coated Graphite RTP RTA Carrier

The VETEK CVD Silicon Carbide (SiC) Coated Graphite RTP RTA Carrier is designed for rapid thermal processing (RTP) and rapid thermal annealing (RTA) systems used in semiconductor manufacturing. Manufactured from high-purity isostatic graphite with a dense CVD SiC coating, it provides outstanding thermal stability, excellent temperature uniformity, superior chemical resistance, and ultra-low particle generation. Engineered to withstand repeated rapid heating and cooling cycles, the carrier ensures reliable wafer support and stable process performance for silicon wafer annealing and other high-temperature semiconductor applications.
CVD Tantalum Carbide(TaC) Coated Susceptor

CVD Tantalum Carbide(TaC) Coated Susceptor

The VETEK CVD TaC Coated Susceptor combines a high-purity isostatic graphite substrate with a dense CVD tantalum carbide (TaC) coating to deliver exceptional thermal stability, corrosion resistance, and low particle generation for demanding semiconductor epitaxy. Designed for SiC, GaN, and AlN epitaxial growth, it minimizes contamination, improves wafer temperature uniformity, and extends component service life in high-temperature MOCVD and CVD processes.
CVD Silicon Carbide(SiC) Coated RTP Susceptor

CVD Silicon Carbide(SiC) Coated RTP Susceptor

The CVD SiC coated RTP susceptor from VeTek Semiconductor serves rapid thermal processing (RTP) and rapid thermal annealing (RTA) equipment used throughout semiconductor manufacturing. The substrate is machined from high‑purity isostatic graphite, over which a dense CVD silicon carbide (SiC) layer is deposited. This construction yields high thermal conductivity, robust chemical inertness, and sustained dimensional stability under repeated high‑temperature cycling.
Three-Piece Graphite Crucibles

Three-Piece Graphite Crucibles

For demanding semiconductor crystal growth applications, the VETEK three‑piece graphite crucible delivers the stability, purity, and thermal evenness that the process requires. Made from high‑grade isostatic graphite—with optional SiC, TaC, or PyC coatings—its split design isn’t just for convenience. It actively reduces thermal stress, makes maintenance faster, and keeps performing cycle after cycle.
PG (Pyrolytic Graphite) Coated Ring

PG (Pyrolytic Graphite) Coated Ring

The VETEK PG (Pyrolytic Graphite) Coated Ring is purpose-built for semiconductor thermal field and crystal growth environments where uniform heat distribution and stable temperatures are non-negotiable. Starting with a high-purity graphite base and finished with a dense Pyrolytic Graphite coating, this component delivers exceptional thermal conductivity, stands up to severe thermal shock, and retains its dimensions over long runs at extreme temperatures. You will find these rings used extensively in crystal growth furnaces, high-temperature ovens, and thermal field assemblies for semiconductors—anywhere that precise temperature control directly drives process repeatability and final product quality.
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