Products

Oxidation and Diffusion Furnace

Oxidation and Diffusion Furnaces are used in various fields such as semiconductor devices, discrete devices, optoelectronic devices, power electronic devices, solar cells, and large-scale integrated circuit manufacturing. They are utilized for processes including diffusion, oxidation, annealing, alloying, and sintering of wafers.


VeTek Semiconductor is a leading manufacturer specializing in the production of high-purity graphite, silicon carbide and quartz components in oxidation and diffusion furnaces. We are committed to providing high-quality furnace components for the semiconductor and photovoltaic industries, and are at the forefront of surface coating technology, such as CVD-SiC, CVD-TaC, pyrocarbon,etc.


The advantages of VeTek Semiconductor silicon carbide components:

● High temperature resistance (up to 1600℃)

● Excellent thermal conductivity and thermal stability

● Good chemical corrosion resistance

● Low coefficient of thermal expansion

● High strength and hardness

● Long service life


In oxidation and diffusion furnaces, due to the presence of high temperature and corrosive gases, many components require the use of high-temperature and corrosion-resistant materials, among which silicon carbide (SiC) is a commonly used choice. The following are common silicon carbide components found in oxidation furnaces and diffusion furnaces:



● Wafer Boat

Silicon carbide wafer boat is a container used to carry silicon wafers, which can withstand high temperatures and will not react with silicon wafers.


● Furnace Tube

The furnace tube is the core component of the diffusion furnace, used to accommodate silicon wafers and control the reaction environment. Silicon carbide furnace tubes have excellent high-temperature and corrosion resistance performance.


● Baffle Plate

Used to regulate the airflow and temperature distribution inside the furnace


● Thermocouple Protection Tube

Used to protect temperature measuring thermocouples from direct contact with corrosive gases.


● Cantilever Paddle

Silicon carbide cantilever paddles are resistant to high temperature and corrosion, and are used to transport silicon boats or quartz boats carrying silicon wafers into the diffusion furnace tubes.


● Gas Injector

Used to introduce reaction gas into the furnace, it needs to be resistant to high temperature and corrosion.


● Boat Carrier

Silicon carbide wafer boat carrier is used to fix and support silicon wafers, which have advantages such as high strength, corrosion resistance, and good structural stability.


● Furnace Door

Silicon carbide coatings or components may also be used on the inside of the furnace door.


● Heating Element

Silicon carbide heating elements are suitable for high temperatures, high power, and can quickly raise temperatures to over 1000℃.


● SiC Liner

Used to protect the inner wall of furnace tubes, it can help reduce the loss of heat energy and withstand harsh environments such as high temperature and high pressure.

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Silicon Carbide Robot Arm

Silicon Carbide Robot Arm

Our silicon carbide (SiC) robotic arm is designed for high-performance wafer handling in advanced semiconductor manufacturing. Made of high-purity silicon carbide, this robotic arm offers exceptional resistance to high temperatures, plasma corrosion, and chemical attack, ensuring reliable operation in demanding cleanroom environments. Its exceptional mechanical strength and dimensional stability enable precise wafer handling while minimizing contamination risks, making it an ideal choice for MOCVD, epitaxy, ion implantation, and other critical wafer handling applications. We welcome your inquiries.
Silicon Carbide SiC wafer boat

Silicon Carbide SiC wafer boat

Veteksemicon SiC wafer boats are widely used in critical high-temperature processes in semiconductor manufacturing, serving as reliable carriers for oxidation, diffusion, and annealing processes for silicon-based integrated circuits. They also excel in the third-generation semiconductor sector, perfectly suited for demanding processes such as epitaxial growth (EPI) and metal-organic chemical vapor deposition (MOCVD) for SiC and GaN power devices. They also support the high-temperature fabrication of high-efficiency solar cells in the photovoltaic industry. Looking forward to your further consultation.
SiC Cantilever Paddles

SiC Cantilever Paddles

Veteksemicon SiC Cantilever Paddles are high-purity silicon carbide support arms designed for wafer handling in horizontal diffusion furnaces and epitaxial reactors. With exceptional thermal conductivity, corrosion resistance, and mechanical strength, these paddles ensure stability and cleanliness in demanding semiconductor environments. Available in custom sizes and optimized for long service life.
SiC Ceramics Membrane

SiC Ceramics Membrane

Veteksemicon SiC ceramics membranes are a type of inorganic membrane and belong to solid membrane materials in membrane separation technology. SiC membranes are fired at a temperature above 2000℃. The surface of the particles is smooth and round. There are no closed pores or channels in the support layer and each layer. They are usually composed of three layers with different pore sizes.
Porous SiC Ceramic Plate

Porous SiC Ceramic Plate

Our porous SiC ceramic plates are porous ceramic materials made of silicon carbide as the main component and processed by special processes. They are indispensable materials in semiconductor manufacturing, chemical vapor deposition (CVD) and other processes.
SiC Ceramics Wafer Boat

SiC Ceramics Wafer Boat

VeTek semiconductor is a leading SiC Ceramics Wafer Boat supplier, manufacturer and factory in China. Our SiC Ceramics Wafer Boat is a vital component in advanced wafer handling processes, catering to the photovoltaic, electronics, and semiconductor industries. Looking forward to your consultation.

Shop high-performance Oxidation and Diffusion Furnace components at Veteksemicon—your trusted source for SiC-based thermal process solutions.


Veteksemicon supplies premium-grade silicon carbide (SiC) components designed specifically for oxidation and diffusion furnace systems in semiconductor manufacturing. These SiC parts exhibit excellent thermal shock resistance, high mechanical strength, and long-term dimensional stability in ultra-high-temperature and oxidizing environments. Ideal for process temperatures exceeding 1200°C, they are widely used in atmospheric and low-pressure diffusion systems, oxidation furnaces, and vertical thermal reactors.


Our product portfolio includes SiC cantilevers, boats, support rods, and tube liners, all engineered for precise wafer positioning and minimal particle contamination. The low thermal expansion coefficient of SiC helps maintain alignment across thermal cycles, while its chemical inertness ensures compatibility with O₂, N₂, H₂, and dopant gases. Whether for dry oxidation or dopant diffusion (e.g., phosphorus or boron), Veteksemicon’s diffusion furnace solutions enhance process stability, extend maintenance intervals, and support 200mm/300mm wafer formats.


For technical drawings, material datasheets, or quotation support, please visit Veteksemicon’s Oxidation and Diffusion Furnace product page or contact our application engineers.


As a professional Oxidation and Diffusion Furnace manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Oxidation and Diffusion Furnace made in China, you can leave us a message.
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