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Oxidation and Diffusion Furnace

Oxidation and Diffusion Furnaces are used in various fields such as semiconductor devices, discrete devices, optoelectronic devices, power electronic devices, solar cells, and large-scale integrated circuit manufacturing. They are utilized for processes including diffusion, oxidation, annealing, alloying, and sintering of wafers.


VeTek Semiconductor is a leading manufacturer specializing in the production of high-purity graphite, silicon carbide and quartz components in oxidation and diffusion furnaces. We are committed to providing high-quality furnace components for the semiconductor and photovoltaic industries, and are at the forefront of surface coating technology, such as CVD-SiC, CVD-TaC, pyrocarbon,etc.


The advantages of VeTek Semiconductor silicon carbide components:

● High temperature resistance (up to 1600℃)

● Excellent thermal conductivity and thermal stability

● Good chemical corrosion resistance

● Low coefficient of thermal expansion

● High strength and hardness

● Long service life


In oxidation and diffusion furnaces, due to the presence of high temperature and corrosive gases, many components require the use of high-temperature and corrosion-resistant materials, among which silicon carbide (SiC) is a commonly used choice. The following are common silicon carbide components found in oxidation furnaces and diffusion furnaces:



● Wafer Boat

Silicon carbide wafer boat is a container used to carry silicon wafers, which can withstand high temperatures and will not react with silicon wafers.


● Furnace Tube

The furnace tube is the core component of the diffusion furnace, used to accommodate silicon wafers and control the reaction environment. Silicon carbide furnace tubes have excellent high-temperature and corrosion resistance performance.


● Baffle Plate

Used to regulate the airflow and temperature distribution inside the furnace


● Thermocouple Protection Tube

Used to protect temperature measuring thermocouples from direct contact with corrosive gases.


● Cantilever Paddle

Silicon carbide cantilever paddles are resistant to high temperature and corrosion, and are used to transport silicon boats or quartz boats carrying silicon wafers into the diffusion furnace tubes.


● Gas Injector

Used to introduce reaction gas into the furnace, it needs to be resistant to high temperature and corrosion.


● Boat Carrier

Silicon carbide wafer boat carrier is used to fix and support silicon wafers, which have advantages such as high strength, corrosion resistance, and good structural stability.


● Furnace Door

Silicon carbide coatings or components may also be used on the inside of the furnace door.


● Heating Element

Silicon carbide heating elements are suitable for high temperatures, high power, and can quickly raise temperatures to over 1000℃.


● SiC Liner

Used to protect the inner wall of furnace tubes, it can help reduce the loss of heat energy and withstand harsh environments such as high temperature and high pressure.

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Silicon Carbide Wafer Boat

Silicon Carbide Wafer Boat

VeTek Semiconductor's high-purity Silicon Carbide Wafer Boat is made of extremely pure silicon carbide material with excellent thermal stability, mechanical strength and chemical resistance. High-purity Silicon Carbide Wafer Boat is used in hot zone applications in semiconductor manufacturing, especially in high-temperature environments, and plays an important role in protecting wafers, transporting materials and maintaining stable processes. VeTek Semiconductor will continue to work hard to innovate and improve the performance of high-purity Silicon Carbide Wafer Boat to meet the evolving needs of semiconductor manufacturing. We look forward to becoming your long-term partner in China.Feel free to inquire us.

Shop high-performance Oxidation and Diffusion Furnace components at Veteksemicon—your trusted source for SiC-based thermal process solutions.


Veteksemicon supplies premium-grade silicon carbide (SiC) components designed specifically for oxidation and diffusion furnace systems in semiconductor manufacturing. These SiC parts exhibit excellent thermal shock resistance, high mechanical strength, and long-term dimensional stability in ultra-high-temperature and oxidizing environments. Ideal for process temperatures exceeding 1200°C, they are widely used in atmospheric and low-pressure diffusion systems, oxidation furnaces, and vertical thermal reactors.


Our product portfolio includes SiC cantilevers, boats, support rods, and tube liners, all engineered for precise wafer positioning and minimal particle contamination. The low thermal expansion coefficient of SiC helps maintain alignment across thermal cycles, while its chemical inertness ensures compatibility with O₂, N₂, H₂, and dopant gases. Whether for dry oxidation or dopant diffusion (e.g., phosphorus or boron), Veteksemicon’s diffusion furnace solutions enhance process stability, extend maintenance intervals, and support 200mm/300mm wafer formats.


For technical drawings, material datasheets, or quotation support, please visit Veteksemicon’s Oxidation and Diffusion Furnace product page or contact our application engineers.


As a professional Oxidation and Diffusion Furnace manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Oxidation and Diffusion Furnace made in China, you can leave us a message.
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