Oxidation and Diffusion Furnace

Oxidation and Diffusion Furnaces are used in various fields such as semiconductor devices, discrete devices, optoelectronic devices, power electronic devices, solar cells, and large-scale integrated circuit manufacturing. They are utilized for processes including diffusion, oxidation, annealing, alloying, and sintering of wafers.

VeTek Semiconductor is a leading manufacturer specializing in the production of high-purity graphite, silicon carbide and quartz components in oxidation and diffusion furnaces. We are committed to providing high-quality furnace components for the semiconductor and photovoltaic industries, and are at the forefront of surface coating technology, such as CVD-SiC, CVD-TaC, pyrocarbon,etc.

The advantages of VeTek Semiconductor silicon carbide components:

High temperature resistance (up to 1600℃)

Excellent thermal conductivity and thermal stability

Good chemical corrosion resistance

Low coefficient of thermal expansion

High strength and hardness

Long service life

In oxidation and diffusion furnaces, due to the presence of high temperature and corrosive gases, many components require the use of high-temperature and corrosion-resistant materials, among which silicon carbide (SiC) is a commonly used choice. The following are common silicon carbide components found in oxidation furnaces and diffusion furnaces:

Wafer Boat

Silicon carbide wafer boat is a container used to carry silicon wafers, which can withstand high temperatures and will not react with silicon wafers.

Furnace Tube

The furnace tube is the core component of the diffusion furnace, used to accommodate silicon wafers and control the reaction environment. Silicon carbide furnace tubes have excellent high-temperature and corrosion resistance performance.

Baffle Plate

Used to regulate the airflow and temperature distribution inside the furnace

Thermocouple Protection Tube

Used to protect temperature measuring thermocouples from direct contact with corrosive gases.

Cantilever Paddle

Silicon carbide cantilever paddles are resistant to high temperature and corrosion, and are used to transport silicon boats or quartz boats carrying silicon wafers into the diffusion furnace tubes.

Gas Injector

Used to introduce reaction gas into the furnace, it needs to be resistant to high temperature and corrosion.

Boat Carrier

Silicon carbide wafer boat carrier is used to fix and support silicon wafers, which have advantages such as high strength, corrosion resistance, and good structural stability.

Furnace Door

Silicon carbide coatings or components may also be used on the inside of the furnace door.

Heating Element

Silicon carbide heating elements are suitable for high temperatures, high power, and can quickly raise temperatures to over 1000℃.

SiC Liner

Used to protect the inner wall of furnace tubes, it can help reduce the loss of heat energy and withstand harsh environments such as high temperature and high pressure.