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Solid Silicon Carbide

VeTek Semiconductor Solid Silicon Carbide is an important ceramic component in plasma etching equipment, solid silicon carbide(CVD silicon carbide) parts in the etching equipment include focusing rings, gas showerhead, tray, edge rings, etc. Due to the low reactivity and conductivity of solid silicon carbide(CVD silicon carbide) to chlorine - and fluorine-containing etching gases, it is an ideal material for plasma etching equipment focusing rings and other components.


For example, the focus ring is an important part placed outside the wafer and in direct contact with the wafer, by applying a voltage to the ring to focus the plasma passing through the ring, thereby focusing the plasma on the wafer to improve the uniformity of processing. The traditional focus ring is made of silicon or quartz, conductive silicon as a common focus ring material, it is almost close to the conductivity of silicon wafers, but the shortage is poor etching resistance in fluorine-containing plasma, etching machine parts materials often used for a period of time, there will be serious corrosion phenomenon, seriously reducing its production efficiency.


Solid SiC Focus Ring Working Principle

Working Principle of Solid SiC Focus Ring


Comparison of Si Based Focusing Ring and CVD SiC Focusing Ring:

Comparison of Si Based Focusing Ring and CVD SiC Focusing Ring
Item Si CVD SiC
Density (g/cm3) 2.33 3.21
Band gap (eV) 1.12 2.3
Thermal conductivity (W/cm℃) 1.5 5
CTE (x10-6/℃) 2.6 4
Elastic modulus (GPa) 150 440
Hardness (GPa) 11.4 24.5
Resistance to wear and corrosion Poor Excellent


VeTek Semiconductor offers advanced solid silicon carbide (CVD silicon carbide) parts like SiC focusing rings for semiconductor equipment. Our solid silicon carbide focusing rings outperform traditional silicon in terms of mechanical strength, chemical resistance, thermal conductivity, high-temperature durability, and ion etching resistance.


Key features of our SiC focusing rings include:

High density for reduced etching rates.

Excellent insulation with a high bandgap.

High thermal conductivity and low coefficient of thermal expansion.

Superior mechanical impact resistance and elasticity.

High hardness, wear resistance, and corrosion resistance.

Manufactured using plasma-enhanced chemical vapor deposition (PECVD) techniques, our SiC focusing rings meet the increasing demands of etching processes in semiconductor manufacturing. They are designed to withstand higher plasma power and energy, specifically in capacitively coupled plasma (CCP) systems.

VeTek Semiconductor's SiC focusing rings provide exceptional performance and reliability in semiconductor device manufacturing. Choose our SiC components for superior quality and efficiency.


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Solid SiC Focus Ring

Solid SiC Focus Ring

Veteksemi solid SiC focus ring significantly improves etching uniformity and process stability by precisely controlling the electric field and airflow at the wafer edge. It is widely used in precision etching processes for silicon, dielectrics, and compound semiconductor materials, and is a key component for ensuring mass production yield and long-term reliable equipment operation.
CVD SiC Coated Graphite Shower Head

CVD SiC Coated Graphite Shower Head

The CVD SiC Coated Graphite Shower Head from Veteksemicon is a high-performance component specifically designed for semiconductor chemical vapor deposition (CVD) processes. Manufactured from high-purity graphite and protected with a chemical vapor deposition (CVD) silicon carbide (SiC) coating, this shower head delivers outstanding durability, thermal stability, and resistance to corrosive process gases. Looking forward to your further consultation.
SiC Edge Ring

SiC Edge Ring

Veteksemicon High-purity SiC edge rings, specially designed for semiconductor etching equipment, feature outstanding corrosion resistance and thermal stability, significantly enhancing wafer yield
High purity CVD SiC raw material

High purity CVD SiC raw material

High purity CVD SiC raw material prepared by CVD is the best source material for silicon carbide crystal growth by physical vapor transport. The density of High purity CVD SiC raw material supplied by VeTek Semiconductor is higher than that of small particles formed by spontaneous combustion of Si and C-containing gases, and it does not require a dedicated sintering furnace and has a nearly constant evaporation rate. It can grow extremely high quality SiC single crystals. Looking forward to your inquiry.
Solid SiC wafer carrier

Solid SiC wafer carrier

VeTek Semiconductor's solid SiC wafer carrier is designed for high temperature and corrosion resistant environments in semiconductor epitaxial processes and is suitable for all types of wafer manufacturing processes with high purity requirements. VeTek Semiconductor is a leading wafer carrier supplier in China and looks forward to becoming your long-term partner in the semiconductor industry.
Solid SiC Disc-shaped Shower Head

Solid SiC Disc-shaped Shower Head

VeTek Semiconductor is a leading semiconductor equipment manufacturer in China and a professional manufacturer and supplier of Solid SiC Disc-shaped Shower Head. Our Disc shape Shower Head is widely used in thin film deposition production such as CVD process to ensure uniform distribution of reaction gas and is one of the core components of CVD furnace.

Veteksemicon solid silicon carbide is the ideal procurement material for high-temperature, high-strength, and corrosion-resistant components used in semiconductor and industrial applications. As a fully dense, monolithic ceramic, solid silicon carbide (SiC) offers unmatched mechanical rigidity, extreme thermal conductivity, and exceptional chemical durability in harsh processing environments. Veteksemicon’s solid SiC is specifically developed for critical structural applications such as SiC wafer carriers, cantilever paddles, susceptors, and showerheads in semiconductor equipment.


Manufactured through pressureless sintering or reaction bonding, our solid silicon carbide parts exhibit excellent wear resistance and thermal shock performance, even at temperatures above 1600°C. These properties make solid SiC the preferred material for CVD/PECVD systems, diffusion furnaces, and oxidation furnaces, where long-term thermal stability and purity are essential.


Veteksemicon also offers custom-machined SiC parts, enabling tight dimensional tolerances, high surface quality, and application-specific geometries. Additionally, solid SiC is non-reactive in both oxidizing and reducing atmospheres, enhancing its suitability for plasma, vacuum, and corrosive gas environments.


To explore our full range of solid silicon carbide components and discuss your project specifications, please visit the Veteksemicon product detail page or contact us for technical support and quotations.


As a professional Solid Silicon Carbide manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Solid Silicon Carbide made in China, you can leave us a message.
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