Solid Silicon Carbide

VeTek Semiconductor Solid Silicon Carbide is an important ceramic component in plasma etching equipment, solid silicon carbide(CVD silicon carbide) parts in the etching equipment include focusing rings, gas showerhead, tray, edge rings, etc. Due to the low reactivity and conductivity of solid silicon carbide(CVD silicon carbide) to chlorine - and fluorine-containing etching gases, it is an ideal material for plasma etching equipment focusing rings and other components.

For example, the focus ring is an important part placed outside the wafer and in direct contact with the wafer, by applying a voltage to the ring to focus the plasma passing through the ring, thereby focusing the plasma on the wafer to improve the uniformity of processing. The traditional focus ring is made of silicon or quartz, conductive silicon as a common focus ring material, it is almost close to the conductivity of silicon wafers, but the shortage is poor etching resistance in fluorine-containing plasma, etching machine parts materials often used for a period of time, there will be serious corrosion phenomenon, seriously reducing its production efficiency.

Solid SiC Focus Ring Working Principle：

Comparison of Si Based Focusing Ring and CVD SiC Focusing Ring：