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The porous structure of graphite
Porous Graphite is a porous structure product made of graphite as the base material. Its material is made of high-purity graphite. The physical parameters of VeTek Semiconductor Porous Graphite vary according to the production process and specific application. The following are common physical parameters:
Typical physical properties of porous graphite |
|
ltem |
Parameter |
Bulk density |
0.89 g/cm2 |
Compressive strength |
8.27 MPa |
Bending strength |
8.27 MPa |
Tensile strength |
1.72 MPa |
Specific resistance |
130Ω-inX10-5 |
Porosity |
50% |
Average pore size |
70um |
Thermal Conductivity |
12W/M*K |
Porous Graphite is made of high-purity graphite and has excellent electrical conductivity, thermal conductivity, high temperature resistance, oxidation resistance, chemical stability and other characteristics. It is widely used in the semiconductor processing industry.
In the semiconductor processing process, Porous Graphite is widely used in the following aspects:
Combined with Porous Graphite's excellent high temperature resistance and chemical stability such as good corrosion resistance to most chemicals such as acids, alkalis, and solvents, Porous Graphite is often used in high-temperature sintering and heat treatment equipment. For example, Porous Graphite can be used as a lining, insulation material or support material for high-temperature furnaces.
Moreover, Porous Graphite Component has excellent electrical conductivity and thermal stability to provide a uniform thermal field and stable electrical properties. Therefore, this product is often used in the diffusion or oxidation process of semiconductor processing as a diffusion source or electrode material.
Porous Graphite's porous structure can filter and purify gases used in semiconductor processing, reduce possible particle contamination, and ensure high cleanliness during the processing. With its porous structure and good air permeability, Porous Graphite parts can also be used as a base and fixture in a vacuum adsorption system to fix wafers or other components through efficient vacuum adsorption.
By adjusting the sintering process of graphite, VeTek Semiconductor can customize porous graphite materials with different pore sizes and porosities to meet different application requirements.
Porous Graphite SiC Crystal Growth Porous Graphite Three-petal Graphite Crucible
In fact, VeTek Semiconductor has an absolute market leading position in China's sic coated graphite susceptor market, tac coated graphite crucible market and silicon carbide coated graphite trays market. VeTek Semiconductor is a professional Chinese Manufacturer, Supplier, Factory of Special Graphite products,such as SiC Crystal Growth Porous Graphite, Pyrolytic Carbon Coating, Vitreous Carbon Coating, Isotropic Graphite, Siliconized Graphite and High Purity Graphite Sheet. we are committed to providing advanced solutions for various Special Graphite products for the semiconductor industry.
If you have any inquiries or need additional details, please don't hesitate to get in touch with us.
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