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Pre-Heat Ring
  • Pre-Heat RingPre-Heat Ring

Pre-Heat Ring

Pre-heat ring is used in the semiconductor epitaxy process to preheat wafers and make the temperature of wafers more stable and uniform, which is of great significance for the high-quality growth of epitaxy layers. Vetek Semiconductor strictly controls the purity of this product to prevent volatilization of impurities at high temperatures.Welcome to have a further discussion with us.

The Pre-Heat Ring is a key equipment specifically designed for the epitaxial (EPI) process in semiconductor manufacturing. It is used to pre-heat wafers before the EPI process, ensuring temperature stability and uniformity throughout the epitaxial growth.


Manufactured by VeTek Semiconductor, our EPI Pre Heat Ring offers several notable features and advantages. Firstly, it is constructed using high thermal conductivity materials, allowing for rapid and uniform heat transfer to the wafer surface. This prevents the formation of hotspots and temperature gradients, ensuring consistent deposition and improving the quality and uniformity of the epitaxial layer. Additionally, our EPI Pre Heat Ring is equipped with an advanced temperature control system, enabling precise and consistent control of the pre-heat temperature. This level of control enhances the accuracy and repeatability of crucial steps such as crystal growth, material deposition, and interface reactions during the EPI process.


Durability and reliability are essential aspects of our product design. The EPI Pre Heat Ring is built to withstand high temperatures and operating pressures, maintaining stability and performance over extended periods. This design approach reduces maintenance and replacement costs, ensuring long-term reliability and operational efficiency. Installation and operation of the EPI Pre Heat Ring are straightforward, as it is compatible with common EPI equipment. It features a user-friendly wafer placement and retrieval mechanism, enhancing convenience and operational efficiency.


At VeTek Semiconductor, we also offer customization services to meet specific customer requirements. This includes tailoring the EPI Pre Heat Ring's size, shape, and temperature range to align with unique production needs. For researchers and manufacturers involved in epitaxial growth and semiconductor device production, the EPI Pre Heat Ring by VeTek Semiconductor provides exceptional performance and reliable support. It serves as a critical tool in achieving high-quality epitaxial growth and facilitating efficient semiconductor device manufacturing processes.


SEM DATA OF CVD SIC FILM

SEM DATA OF CVD SIC FILM

Basic physical properties of CVD SiC coating:

Basic physical properties of CVD SiC coating
Property Typical Value
Crystal Structure FCC β phase polycrystalline, mainly (111) oriented
SiC coating Density 3.21 g/cm³
SiC coating Hardness 2500 Vickers hardness(500g load)
Grain Size 2~10μm
Chemical Purity 99.99995%
Heat Capacity 640 J·kg-1·K-1
Sublimation Temperature 2700℃
Flexural Strength 415 MPa RT 4-point
Young' s Modulus 430 Gpa 4pt bend, 1300℃
Thermal Conductivity 300W·m-1·K-1
Thermal Expansion(CTE) 4.5×10-6K-1


VeTek Semiconductor Pre-Heat Ring Production Shop

SiC Graphite substratePre-Heat Ring testSilicon carbide ceramic processingEPI process equipment


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