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China CVD SiC Coating Manufacturer, Supplier, Factory

We try for excellence, services the customers", hopes to become the ideal cooperation team and dominator company for staff, suppliers and buyers, realizes value share and continuous marketing for CVD SiC Coating, Wafer Carrier for Etching process, Carrier wafer, SiC Coated Wafer Carrier, Etching Process, In purchase to expand our international market, we mainly provide our oversea prospects Top quality performance items and assistance.
CVD SiC Coating, In order to meet the increasing requirement of customers both home and aboard, we'll keep carrying forward the enterprise spirit of "Quality, Creativity, Efficiency and Credit" and strive to top the current trend and lead fashion. We warmly welcome you to visit our company and make cooperation.

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  • CVD TaC Coating Wafer Carrier

    CVD TaC Coating Wafer Carrier

    As a professional CVD TaC Coating Wafer Carrier product manufacturer and factory in China, VeTek Semiconductor CVD TaC Coating Wafer Carrier is a wafer carrying tool specially designed for high temperature and corrosive environments in semiconductor manufacturing. and CVD TaC Coating Wafer Carrier has high mechanical strength, excellent corrosion resistance and thermal stability, providing the necessary guarantee for manufacturing high-quality semiconductor devices. Your further inquiries are welcome.
  • SiC Coated Planetary Susceptor

    SiC Coated Planetary Susceptor

    Our SiC Coated Planetary Susceptor is a core component in the high temperature process of semiconductor manufacturing. Its design combines graphite substrate with silicon carbide coating to achieve comprehensive optimization of thermal management performance, chemical stability and mechanical strength.
  • SiC Coating Collector Top

    SiC Coating Collector Top

    Welcome to VeTek Semiconductor, your trusted manufacturer of CVD SiC coatings. We take pride in offering Aixtron SiC Coating Collector Top, which are expertly engineered using high purity graphite and feature a state-of-the-art CVD SiC coating with impurity below 5ppm. Please don't hesitate to reach out to us with any questions or inquiries
  • TaC Coating Spare Part

    TaC Coating Spare Part

    TaC Coating is currently mainly used in processes such as silicon carbide single crystal growth (PVT method), epitaxial disk (including silicon carbide epitaxy, LED epitaxy), etc. Combined with the good long-term stability of TaC Coating Plate, Veteksemicon's TaC Coating Plate has become the benchmark for TaC Coating spare parts. We look forward to you becoming our long-term partner.
  • SiC Cantilever Paddle

    SiC Cantilever Paddle

    VeTek Semiconductor's SiC Cantilever Paddle is used in heat treatment furnaces for handling and supporting wafer boats. The high temperature stability and high thermal conductivity of SiC material ensure high efficiency and reliability in the semiconductor processing process. We are committed to providing high-quality products at competitive prices and look forward to becoming your long-term partner in China.
  • High purity Rigid felt tube

    High purity Rigid felt tube

    VeTek Semiconductor high purity rigid felt tubes are the first choice for high-temperature applications in the semiconductor industry. Their high compressive strength and excellent thermal insulation properties make them reliable and efficient components in the crystal growth process. VeTek Semiconductor has always been committed to providing advanced and reliable high-purity rigid felt tube technology and product solutions for the semiconductor industry. We welcome your further inquiries.

  • Material of silicon carbide epitaxy

    Silicon carbide is reshaping the semiconductor industry for power and high-temperature applications, with its comprehensive properties, from epitaxial substrates to protective coatings to electric vehicles and renewable energy systems.

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  • Chip Manufacturing: Atomic Layer Deposition (ALD)

    In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

  • Italy's LPE's 200mm SiC epitaxial technology progress

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  • Application of carbon-based thermal field materials in silicon carbide crystal growth

    Silicon carbide (SiC)'s Key growth methods include PVT, TSSG, and HTCVD, each with distinct advantages and challenges. Carbon-based thermal field materials like insulation systems, crucibles, TaC coatings, and porous graphite enhance crystal growth by providing stability, thermal conductivity, and purity, essential for SiC's precise fabrication and application.

  • Semiconductor substrate wafer: Material properties of silicon, GaAs, SiC and GaN

    The article analyzes the material properties of semiconductor substrate wafers such as silicon, GaAs, SiC and GaN

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