AMAT 0200-03201 CVD SiC Wafer Lift Pin

Product Features

 ● High-purity graphite core + CVD SiC coating – built for real semiconductor production.

 ● Handles high-temperature epitaxy runs without losing mechanical stability cycle after cycle.

 ● Thin wall shape cuts down thermal mass and improves wafer handling precision.

 ● SiC layer stands up to aggressive process gases and chemical cleaning.

 ● Smooth, uniform coating means less particle shedding and more stable processing.We hold tight tolerances with CNC machining for critical semiconductor parts.

Basic Physical Properties of CVD SiC Coating

Applications

 ● Silicon epitaxy (Si EPI) – lifting, positioning, and moving wafers inside 300mm reactors.

 ● General semiconductor wafer processing where you need heat stability, corrosion resistance, low particles, and long part life.

 ● AMAT epitaxy chambers and compatible wafer handling systems.

Why Choose VeTek Semiconductor

 ● High-purity SiC coated graphite that's meant for semiconductor use.

 ● Thermal stability and chemical resistance are both solid.

 ● Keep tolerances tight — precision machining is our thing.

 ● Compatible with AMAT, ASM, Aixtron, and LPE.