VeTek Semiconductor is your innovative partner in the field of semiconductor processing. With our extensive portfolio of semiconductor-grade Silicon Carbide Ceramics material combinations, component manufacturing capabilities, and application engineering services, we can help you overcome significant challenges. Engineering technical Silicon Carbide Ceramics are widely applied in the semiconductor industry due to their exceptional material performance. VeTek Semiconductor's ultra-pure Silicon Carbide Ceramics are frequently used throughout the entire cycle of semiconductor manufacturing and processing.
DIFFUSION & LPCVD PROCESSING
VeTek Semiconductor provides engineered ceramics components specifically designed for batch diffusion and LPCVD requirements including:
● Baffles & holders
● Injectors
● Liners & process tubes
● Silicon Carbide Cantilever Paddles
● Wafer boats and pedestals
ETCH PROCESS COMPONENTS
Minimize contamination and unscheduled maintenance with high- purity components engineered for the rigors of plasma etch processing, including:
● Focus rings
● Nozzles
● Shields
● Showerheads
● Windows / Lids
● Other custom components
RAPID THERMAL PROCESSING & EPITAXIAL PROCESS COMPONENTS
VeTek Semiconductor provides advanced material components tailored for high-temperature thermal processing applications in the semiconductor industry. These applications encompass RTP, Epi processes, diffusion, oxidation, and annealing. Our technical ceramics are designed to withstand thermal shocks, delivering reliable and consistent performance. With VeTek Semiconductor's components, semiconductor manufacturers can achieve efficient and high-quality thermal processing, contributing to the overall success of semiconductor production.
● Diffusers
● Insulators
● Susceptors
● Other custom thermal components
Key Features
● Ultra-high purity: SiC content >99.96%, free silicon <0.1%, minimizing metal contamination.
● Excellent high-temperature performance: working temperature up to 1600°C (oxidizing) / 1700°C (reducing).
● Superior thermal shock resistance and low thermal expansion for reliable performance under rapid thermal cycles.
● High mechanical strength (compression >600 MPa) and chemical inertness against process gases and plasmas.
● Comprehensive product range for diffusion/LPCVD, etch, RTP and epi processes — from wafer boats to focus rings and custom parts.
● Long service life and reduced particle generation, helping lower maintenance frequency and improve yield.
Product Specifications
Physical properties of Recrystallized Silicon Carbide
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Property
|
Typical Value
|
|
Working temperature (°C)
|
1600°C (with oxygen), 1700°C (reducing environment)
|
|
SiC / SiC content
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> 99.96%
|
|
Si / Free Si content
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< 0.1%
|
|
Bulk density
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2.60-2.70 g/cm³
|
|
Apparent porosity
|
< 16%
|
|
Compression strength
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> 600 MPa
|
|
Cold bending strength
|
80-90 MPa (20°C)
|
|
Hot bending strength
|
90-100 MPa (1400°C)
|
|
Thermal expansion @1500°C
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4.70 × 10⁻⁶/°C
|
|
Thermal conductivity @1200°C
|
23 W/m·K
|
|
Elastic modulus
|
240 GPa
|
|
Thermal shock resistance
|
Extremely good
|
Applications
To meet the diverse needs of semiconductor processes, VeTek offers targeted Silicon Carbide Ceramics products. The following table classifies them by major application areas:
|
Application Field
|
Typical Products
|
Application Description
|
|
Diffusion & LPCVD
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SiC wafer boats, cantilever paddles, process tubes, liners, injectors, baffles & holders
|
High-purity SiC components for batch diffusion and LPCVD furnaces; excellent thermal stability and chemical resistance up to 1600–1700°C, low contamination.
|
|
Plasma Etch Process
|
Focus rings, nozzles, shields, showerheads, windows/lids, custom etch components
|
High-purity SiC parts engineered for plasma etch environments; minimize particle generation and unscheduled maintenance, superior plasma resistance.
|
|
RTP / Epitaxial / Thermal Processing
|
susceptors, diffusers, insulators, custom thermal components
|
Components for RTP, epi, diffusion, oxidation and annealing; designed to withstand thermal shocks and deliver consistent high-temperature performance.
|
|
SiC Crystal Growth (PVT)
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High purity SiC powder, 7N CVD SiC raw material, seed bonding related parts
|
Ultra-pure SiC source materials and supporting components for PVT SiC single crystal growth, improving yield and crystal quality.
|
|
Wafer Handling & Carriers
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Vertical/horizontal SiC wafer boats, silicon cassette boats, pedestals, seal rings
|
Precision carriers and sealing components that provide thermal uniformity, mechanical stability and minimal contamination during high-temperature processing.
|
For more detailed process matching solutions, please refer to the Oxidation and Diffusion Furnace related pages.
As a professional Silicon Carbide Ceramics manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon Carbide Ceramics made in China, you can leave us a message.
