VeTek semiconductor is a leading manufacturer of Tantalum Carbide Coating materials for the semiconductor industry. Our main product offerings include CVD tantalum carbide coating parts, sintered TaC coating parts for SiC crystal growth or semiconductor epitaxy process. Passed ISO9001, VeTek Semiconductor has good control on quality. VeTek Semiconductor is dedicated to become innovator in Tantalum Carbide Coating industry through ongoing research and development of iterative technologies.
The main products are TaC Coated Guide Ring, CVD TaC coated three-petal guide ring, Tantalum Carbide TaC Coated Halfmoon, CVD TaC coating planetary SiC epitaxial susceptor, Tantalum Carbide Coating Ring, Tantalum Carbide Coated Porous Graphite, TaC Coating Rotation Susceptor, Tantalum Carbide Ring, TaC Coating Rotation Plate, TaC coated wafer susceptor, TaC Coated Deflector Ring, CVD TaC Coating Cover, TaC Coated Chuck etc., the purity is below 5ppm, can meet customer requirements.
TaC coating graphite is created by coating the surface of a high-purity graphite substrate with a fine layer of tantalum carbide by a proprietary Chemical Vapor Deposition (CVD) process.The advantage is showed in below picture:
The tantalum carbide (TaC) coating has gained attention due to its high melting point of up to 3880°C, excellent mechanical strength, hardness, and resistance to thermal shocks, making it an attractive alternative to compound semiconductor epitaxy processes with higher temperature requirements, such as Aixtron MOCVD system and LPE SiC epitaxy process.It also has a wide application in PVT method SiC crystal growth process.
Key Features
● Temperature stability up to 2500°C with excellent resistance to thermal shock.
● Ultra-high purity (<5ppm) and strong adhesion to graphite for minimal particle generation.
● Superior resistance to H₂, NH₃, SiH₄ and Si vapors in harsh process environments.
● Conformal coating coverage with size capability up to 750mm diameter, uniquely available in China.
Product Specification
Parameter of VeTek Semiconductor Tantalum Carbide Coating:
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Physical properties of TaC coating
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Density
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14.3 g/cm³
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Hardness
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2000 HK
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Thermal expansion
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6.3×10⁻⁶/K
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Resistance
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1×10⁻⁵ Ohm·cm
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Thermal stability
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<2500°C
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Coating thickness
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≥20μm (typical 35±10μm)
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carbide (TaC) coating on a microscopic cross-section:
TaC coating EDX data：
TaC coating crystal structure data：
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Element
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Atomic percent
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Pt. 1
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Pt. 2
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Pt. 3
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Average
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C K
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52.10
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57.41
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52.37
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53.96
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Ta M
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47.90
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42.59
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47.63
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46.04
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Applications
To meet the diverse needs of semiconductor processes, VeTek offers targeted Tantalum Carbide Coating products. The following table classifies them by major application areas, listing typical components and applicable processes:
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Application Field
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Typical Products
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Application Description
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SiC Epitaxy
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CVD TaC coated planetary susceptor,TaC coated wafer susceptor,TaC coated guide ring
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Suitable for high-temperature SiC epitaxial processes (e.g., LPE method), providing high thermal stability and a low-contamination interface to ensure film uniformity.
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GaN / LED Epitaxy (MOCVD)
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Shower head, satellite disk, masking ring, heat shield, injection nozzle
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Suitable for Aixtron MOCVD systems, resistant to H₂/NH₃ corrosion, reducing particle contamination and improving LED epitaxial yield.
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SiC Crystal Growth (PVT Method)
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TaC coated porous graphite,TaC coated halfmoon,guide ring,cover,chuck
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Used in PVT SiC ingot growth, withstands up to 2500°C, prevents graphite reactions, and ensures crystal purity.
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High-Temperature Heating & Supporting Components
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Inductive heating susceptor,resistive heating element,wafer carrier
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Suitable for induction or resistive heating systems, offering high hardness and thermal shock resistance, extending component lifespan by 3–5 times.
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For more detailed process matching solutions, please refer to the Silicon Carbide Epitaxy related application page.
We support customized services based on customer requirements. Passed ISO9001 with good quality control.
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