CVD TaC Coated Susceptor

Product Definition and Composition

The VETEK CVD TaC Coated Susceptor is a high-end wafer carrier component specifically used for third-generation semiconductor (SiC, GaN, AlN) epitaxial processing. This product combines the physical advantages of two high-performance materials:

High-Purity Graphite Substrate: Utilizes an isostatic pressing molding process to ensure the substrate possesses superior structural strength, high density, and thermal processing stability.

CVD TaC Coating: A dense, stress-free Tantalum Carbide (TaC) protective layer is grown on the graphite surface through advanced Chemical Vapor Deposition (CVD) technology.

Core Technical Advantages: Extraordinary Extreme Environment Adaptability

In the MOCVD process, the TaC coating is not only a physical protective layer but also the core to ensuring process repeatability:

Tolerance to Extreme High Temperatures: TaC has a melting point as high as 3880°C, maintaining excellent shape stability even in ultra-high temperature epitaxial processes above 1600°C.

Excellent Corrosion Resistance: In strong reducing environments containing NH₃(Ammonia) or H₂(Hydrogen), the corrosion rate of TaC is extremely low, effectively preventing substrate loss and impurity precipitation.

Ultra-High Purity Guarantee: The coating purity is as high as 99.9995%. Its dense structure completely seals graphite micropores, ensuring the epitaxial film reaches extremely low impurity levels.

Precise Thermal Field Distribution: VETEK’s optimized coating control technology ensures the susceptor surface temperature difference is controlled within ±2°C, significantly improving the thickness and wavelength consistency of the wafer epitaxial layer.

Technical Parameters

Tantalum carbide (TaC) coating on a microscopic cross-section:

Core Application Fields

SiC (Silicon Carbide) Epitaxial Growth: Supports the production of 6-inch, 8-inch, and larger size SiC power devices.

GaN (Gallium Nitride) Based Devices: Used in MOCVD processes for high-brightness LEDs, HEMT power devices, and RF chips.

AlN (Aluminum Nitride) and UVC Growth: Provides extreme high-temperature (1400°C+) carrier solutions for ultra-wide bandgap materials such as Deep UV LEDs.

Customized Research Support: Adapts to the precision customization needs of research institutes for various irregular parts and multi-hole disks.

Compatible Models and Customization Services

VETEK possesses precise mechanical processing and coating capabilities, perfectly adapting to global mainstream MOCVD equipment:

AIXTRON: Supports various planetary rotation disks and bases.

Veeco: Supports K465i, Propel, and other vertical susceptor series.

AMEC and Others: Provides fully compatible replacement parts or upgrade solutions.