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China Graphite Susceptor Manufacturer, Supplier, Factory

We've been experienced manufacturer. Wining the majority on the crucial certifications of its market for Graphite Susceptor, EPI Susceptor Part, SiC susceptor, EPI Susceptor, CVD Susceptor, Top quality and competitive rates make our products and solutions appreciate a higher name all around the word.
Graphite Susceptor, During the short years, we serve our clients honestly as Quality First, Integrity Prime, Delivery Timely, which has earned us an outstanding reputation and an impressive client care portfolio. Looking forward to working with you Now!

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  • SiC Coated Top Plate for LPE PE2061S

    SiC Coated Top Plate for LPE PE2061S

    VeTek Semiconductor has been deeply engaged in SiC coating products for many years and has become a leading manufacturer and supplier of SiC Coated Top Plate for LPE PE2061S in China. The SiC Coated Top Plate for LPE PE2061S we provide is designed for LPE silicon epitaxial reactors and is located on the top together with the barrel base. This SiC Coated Top Plate for LPE PE2061S has excellent characteristics such as high purity, excellent thermal stability and uniformity, which helps to grow high-quality epitaxial layers. No matter what product you need, we look forward to your inquiry.
  • Semiconductor Susceptor Block SiC Coated

    Semiconductor Susceptor Block SiC Coated

    VeTek Semiconductor's Semiconductor susceptor block SiC coated is a highly reliable and durable device. It is designed to withstand high temperatures and harsh chemical environments while maintaining stable performance and a long lifespan. With its excellent process capabilities, the Semiconductor Susceptor Block SiC Coated reduces the frequency of replacement and maintenance, thus improving production efficiency. We look forward to the opportunity to collaborate with you.Welcome to consult at any time.
  • Tantalum Carbide Coating Cover

    Tantalum Carbide Coating Cover

    Tantalum Carbide Coating Cover is composed of high-purity graphite and TaC coating. VeTek Semiconductor is a leading supplier and manufacturer of Tantalum Carbide Coating Cover in China. We focus on providing high-purity, high-temperature resistant tantalum carbide products. Our tantalum carbide coated cover have excellent performance and reliability, and can effectively protect materials in extremely high temperature and corrosive environments. We look forward to becoming your long-term partner in China. Welcome to consult at any time.
  • Quartz bell jar

    Quartz bell jar

    Vetek Semiconductor is a professional Semiconductor Quartz Bell Jar manufacturer and supplier in China. Our Semiconductor Quartz Bell Jar is widely used in key components of semiconductor manufacturing equipment, especially in CVD, diffusion, oxidation and PVD processes. Vetek Semiconductor is committed to providing advanced Semiconductor Quartz Bell Jar products and technical solutions for the semiconductor industry. Welcome your further inquiries.
  • CVD TaC coating planetary SiC epitaxial susceptor

    CVD TaC coating planetary SiC epitaxial susceptor

    CVD TaC coating planetary SiC epitaxial susceptor is one of the core components of MOCVD planetary reactor. Through CVD TaC coating planetary SiC epitaxial susceptor, the large disk orbits and the small disk rotates, and the horizontal flow model is extended to multi-chip machines, so that it has both the high-quality epitaxial wavelength uniformity management and defect optimization of single-chip machines and the production cost advantages of multi-chip machines.VeTek Semiconductor can provide customers with highly customized CVD TaC coating planetary SiC epitaxial susceptor. If you also want to make a planetary MOCVD furnace like Aixtron, come to us!
  • ALD Planetary Susceptor

    ALD Planetary Susceptor

    ALD process,means Atomic Layer Epitaxy process. Vetek Semiconductor and ALD system manufacturers have developed and produced SiC coated ALD Planetary Susceptors that meet the high requirements of the ALD process to evenly distribute the airflow over the substrate. At the same time, our high purity CVD SiC coating ensures purity in the process. Welcome to discuss cooperation with us.

  • What is an Electrostatic Chuck (ESC)?

    The electrostatic chuck(ESC), also known as the electrostatic chuck (ESC, e-chuck), is a fixture that uses the principle of electrostatic adsorption to hold and fix the adsorbed material. It is suitable for vacuum and plasma environments.

  • What is a PECVD graphite boat ?

    The core material of PECVD graphite boat is high-purity isotropic graphite material (purity is usually ≥99.999%), which has excellent electrical conductivity, thermal conductivity and density. Compared with ordinary graphite boats, PECVD graphite boats have many physical and chemical property advantages and are mainly used in the semiconductor and photovoltaic industries, especially in PECVD and CVD processes.

  • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

    In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

  • Exploratory application of 3D printing technology in the semiconductor industry

    In an era of rapid technological development, 3D printing, as an important representative of advanced manufacturing technology, is gradually changing the face of traditional manufacturing. With the continuous maturity of technology and the reduction of costs, 3D printing technology has shown broad application prospects in many fields such as aerospace, automobile manufacturing, medical equipment, and architectural design, and has promoted the innovation and development of these industries.

  • Different technical routes of SiC epitaxial growth furnace

    Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

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