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Tantalum Carbide Coated Planetary Rotation Disk
  • Tantalum Carbide Coated Planetary Rotation DiskTantalum Carbide Coated Planetary Rotation Disk
  • Tantalum Carbide Coated Planetary Rotation DiskTantalum Carbide Coated Planetary Rotation Disk

Tantalum Carbide Coated Planetary Rotation Disk

VeTek Semiconductor is a leading manufacturer and supplier of Tantalum Carbide Coated Planetary Rotation Disk in China, focusing on TaC coating technology for many years. Our products have high purity and excellent high temperature resistance, which are widely recognized by semiconductor manufacturers. VeTek Semiconductor Tantalum Carbide Coated Planetary Rotation Disk has become the backbone of the wafer epitaxy industry. We look forward to establishing a long-term partnership with you to jointly promote technological progress and production optimization.


High quality Tantalum Carbide Coated Planetary Rotation Disk is offered by China manufacturer VeTek Semiconductor. Buy Tantalum Carbide Coated Planetary Rotation Disk which is of high quality directly with low price.

The tantalum carbide coated planetary rotation disk is an accessory designed for the AIXTRON G10 MOCVD system, aiming to enhance efficiency and quality in semiconductor manufacturing. Crafted from high-quality materials and manufactured with precision, the tantalum carbide coated planetary rotation disk offers outstanding performance and reliability for Metal-Organic Chemical Vapor Deposition (MOCVD) processes.

The Planetary Disk is constructed using a graphite substrate coated with CVD TaC, providing excellent thermal stability, high purity, and resistance to high temperatures.

Customizable to accommodate different semiconductor wafer sizes, the Planetary Disk is suitable for various production requirements. Its robust construction is specifically designed to withstand the demanding operating conditions of the MOCVD system, ensuring long-lasting performance and minimizing downtime and maintenance costs associated with wafer carriers and susceptors.

With the Planetary Disk, the AIXTRON G10 MOCVD system can achieve higher efficiency and superior results in semiconductor manufacturing. Its exceptional thermal stability, compatibility with different wafer sizes, and reliable performance make it an essential tool for optimizing production efficiency and achieving outstanding outcomes in the challenging MOCVD environment.

Product parameter of the Tantalum Carbide Coated Planetary Rotation Disk:

Physical properties of TaC coating
TaC coating Density 14.3 (g/cm³)
Specific emissivity 0.3
Thermal expansion coefficient 6.3*10-6/K
TaC coating Hardness (HK) 2000 HK
Resistance 1×10-5 Ohm*cm
Thermal stability <2500℃
Graphite size changes -10~-20um
Coating thickness ≥20um typical value (35um±10um)


AlGaN barrier: Al composition uniformity:

Al composition uniformity


VeTek Semiconductor Production Shop:

VeTek Semiconductor Production Shop

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