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China TaC Coated Porous Graphite Manufacturer, Supplier, Factory

With superior technologies and facilities, strict quality command, reasonable cost, exceptional provider and close co-operation with customers, we've been devoted to delivering the best benefit for our buyers for TaC Coated Porous Graphite, Tantalum Carbide Coating, Porous Graphite, SiC Crystal Growth, PVT Method, We sincerely welcome friends to barter business enterprise and start cooperation with us. We hope to hitch hands with close friends in different industries to produce a brilliant long run.
TaC Coated Porous Graphite, Our company regards "reasonable prices, efficient production time and good after-sales service" as our tenet. We hope to cooperate with more customers for mutual development and benefits. We welcome potential buyers to contact us.

Hot Products

  • CVD SiC Coated RTP Susceptor

    CVD SiC Coated RTP Susceptor

    The CVD SiC coated RTP susceptor from VeTek Semiconductor serves rapid thermal processing (RTP) and rapid thermal annealing (RTA) equipment used throughout semiconductor manufacturing. The substrate is machined from high‑purity isostatic graphite, over which a dense CVD silicon carbide (SiC) layer is deposited. This construction yields high thermal conductivity, robust chemical inertness, and sustained dimensional stability under repeated high‑temperature cycling.
  • CVD TaC Coating Carrier

    CVD TaC Coating Carrier

    CVD TaC Coating carrier is mainly designed for the epitaxial process of semiconductor manufacturing. CVD TaC Coating carrier’s Ultra-high melting point, excellent corrosion resistance, and outstanding thermal stability determine the indispensability of this product in semiconductor epitaxial process. Welcome your further inquiry.
  • Focus ring for Etching

    Focus ring for Etching

    Focus ring for Etching is the key component to ensure process accuracy and stability. These components are precisely assembled in a vacuum chamber to achieve uniform machining of nanoscale structures on the wafer surface through precise control of plasma distribution, edge temperature and electric field uniformity.
  • Plasma Etching Focus Ring

    Plasma Etching Focus Ring

    An important component used in the wafer fabrication etching process is the plasma etching focus ring, whose function is to hold the wafer in place to maintain plasma density and prevent contamination of the wafer sides.Vetek semiconductor provide plasma etching focus ring with different material like monocrystalline silicon, silicon carbide, boron carbide and other ceramic materials.
  • CVD SiC Coated Wafer Barrel Holder

    CVD SiC Coated Wafer Barrel Holder

    CVD SiC coated wafer Barrel holder is the key component of epitaxial growth furnace, widely used in MOCVD epitaxial growth furnaces. VeTek Semiconductor provides you with highly customized products. No matter what your needs are for CVD SiC coated wafer Barrel holder, Welcome to consult us.
  • Semiconductor Fused Quartz Ring

    Semiconductor Fused Quartz Ring

    VeTeksemi's semiconductor fused quartz ring is an indispensable core component in the semiconductor etching process, with excellent purity, extremely high thermal stability and outstanding chemical resistance.Welcome your further inquiry.

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