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Welcome customers to visit Veteksemicon's SiC Coating/ TaC Coating and Epitaxy Process Factory05 2024-09

Welcome customers to visit Veteksemicon's SiC Coating/ TaC Coating and Epitaxy Process Factory

On September 5, VeTek Semiconductor's customers visited the SiC Coating and TaC Coating factories and reached further agreements on the latest Epitaxial Process solutions.
Welcome Customers to Visit Veteksemicon's Carbon Fiber Products Factory10 2025-09

Welcome Customers to Visit Veteksemicon's Carbon Fiber Products Factory

On September 5, 2025, a customer from Poland visited a factory under VETEK to learn about our advanced technologies and innovative processes in the production of carbon fiber products.
How Do Tantalum Carbide Coatings Stabilize the PVT Thermal Field?17 2025-12

How Do Tantalum Carbide Coatings Stabilize the PVT Thermal Field?

​In the silicon carbide (SiC) PVT crystal growth process, the stability and uniformity of the thermal field directly determine the crystal growth rate, defect density, and material uniformity. As the system boundary, thermal-field components exhibit surface thermophysical properties whose slight fluctuations are dramatically amplified under high-temperature conditions, ultimately leading to instability at the growth interface.
Why Silicon carbide(SiC) PVT Crystal Growth Cannot Do Without Tantalum Carbide Coatings(TaC)?13 2025-12

Why Silicon carbide(SiC) PVT Crystal Growth Cannot Do Without Tantalum Carbide Coatings(TaC)?

In the process of growing silicon carbide (SiC) crystals via the Physical Vapor Transport (PVT) method, the extreme high temperature of 2000–2500 °C is a “double-edged sword” — while it drives the sublimation and transport of source materials, it also dramatically intensifies impurity release from all materials within the thermal field system, especially trace metallic elements contained in conventional graphite hot-zone components. Once these impurities enter the growth interface, they will directly damage the core quality of the crystal. This is the fundamental reason why tantalum carbide (TaC) coatings have become a “mandatory option” rather than an “optional choice” for PVT crystal growth.
What Are the Machining and Processing Methods for Aluminum Oxide Ceramics12 2025-12

What Are the Machining and Processing Methods for Aluminum Oxide Ceramics

At Veteksemicon, we navigate these challenges daily, specializing in transforming advanced Aluminum Oxide Ceramics into solutions that meet exacting specifications. Understanding the right machining and processing methods is crucial, as the wrong approach can lead to costly waste and component failure. Let’s explore the professional techniques that make this possible.
Why is CO₂ Introduced During the Wafer Dicing Process?10 2025-12

Why is CO₂ Introduced During the Wafer Dicing Process?

Introducing CO₂ into the dicing water during wafer cutting is an effective process measure to suppress static charge buildup and lower contamination risk, thereby improving dicing yield and long-term chip reliability.
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