News

On September 5, VeTek Semiconductor's customers visited the SiC Coating and TaC Coating factories and reached further agreements on the latest Epitaxial Process solutions.

On September 5, 2025, a customer from Poland visited a factory under VETEK to learn about our advanced technologies and innovative processes in the production of carbon fiber products.

In semiconductor manufacturing, Chemical Mechanical Planarization (CMP) plays a vital role. The CMP process combines chemical and mechanical actions to smooth the surface of silicon wafers, providing a uniform foundation for subsequent steps such as thin-film deposition and etching. CMP polishing slurry, as the core component of this process, significantly impacts polishing efficiency, surface quality, and the final performance of the product

Wafer CMP polishing slurry is a specially formulated liquid material used in the CMP process of semiconductor manufacturing. It consists of water, chemical etchants, abrasives, and surfactants, enabling both chemical etching and mechanical polishing.

Silicon carbide abrasives are typically produced using quartz and petroleum coke as primary raw materials. In the preparatory stage, these materials undergo mechanical processing to achieve the desired particle size before being chemically proportioned into furnace charge.

Over the past few years, the center stage of packaging technology has gradually been ceded to a seemingly "old technology" - CMP (Chemical Mechanical Polishing). When Hybrid Bonding becomes the leading role of the new generation of advanced packaging, CMP is gradually moving from behind the scenes to the spotlight.