Welcome customers to visit Veteksemicon's SiC Coating/ TaC Coating and Epitaxy Process Factory

Customers visit the factory: Promote a new chapter of cooperation

Recently, we are very honored to receive important customers from many regions around the world to visit VeTek Semiconductor's factory in China. This visit not only allows customers to gain an in-depth understanding of our technological innovation and production strength in the fields of Semiconductor Epitaxy Process and Semiconductor Coating, but also further deepens our cooperative relationship with customers.

Veteksemicon customers inspect the details of Tantalum Carbide coated epitaxial susceptors

Factory visit: In-depth understanding of the production process

During the visit, customers showed great interest in our Silicon Carbide Coating and Tantalum Carbide Coating production lines. Our R&D team introduced the technical advantages of the products and the strict quality control system in detail. As a leading manufacturer of Silicon Carbide Coating and Tantalum Carbide Coating, we are always committed to applying the most cutting-edge technology to product design and manufacturing to ensure that every component meets international standards and can meet the needs of different customers.

Technology display: leading the direction of industry development

During the visit, our company demonstrated the latest developed Epitaxial Process solution, covering the complete process from design, production to quality inspection. Our innovation ability has been highly recognized by customers, and they are full of expectations for future cooperation. Especially in the field of semiconductor coating applications, VeTek semiconductor is continuously promoting the development of the industry with its unique technical advantages and market insights.

Future Outlook: Deepen cooperation and win-win future

This customer visit is not only a recognition of our production strength, but also lays a solid foundation for the long-term cooperation between the two parties in the future. We believe that with the joint efforts of both parties, we will achieve more fruitful results in the field of semiconductor epitaxy process and semiconductor coating in the future.