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PSS Etching Carrier Plate for Semiconductor
  • PSS Etching Carrier Plate for SemiconductorPSS Etching Carrier Plate for Semiconductor
  • PSS Etching Carrier Plate for SemiconductorPSS Etching Carrier Plate for Semiconductor

PSS Etching Carrier Plate for Semiconductor

VeTek Semiconductor's PSS Etching Carrier Plate for Semiconductor is a high-quality, ultra-pure graphite carrier designed for wafer handling processes. Our carriers have excellent performance and can perform well in harsh environments, high temperatures and harsh chemical cleaning conditions. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.You are welcome to come to China to visit our factory and learn more about our technology and products.

As a leading professional manufacturer in the field, VeTek Semiconductor is delighted to offer you top-notch PSS Etching Carrier Plates tailored specifically for the semiconductor industry.


Our PSS Etching Carrier Plates for Semiconductors are highly specialized components that are indispensable in the Plasma Source Spectroscopy (PSS) etching procedures within the semiconductor manufacturing realm. These plates assume a pivotal role during the etching process. They provide stable support and ensure smooth transportation of semiconductor wafers, which is crucial for the precision and quality of the etching operation.


We warmly invite you to reach out to us for any inquiries. We're always ready to assist and provide more detailed information about our outstanding products.




PSS Etching Carrier Plate for Semiconductor Key Features:

●  Precision Design: The carrier plate is engineered with precise dimensions and surface flatness to ensure uniform and consistent etching across the semiconductor wafers. It provides a stable and controlled platform for the wafers, allowing for accurate and reliable etching results.

●  Plasma Resistance: The carrier plate exhibits excellent resistance to the plasma used in the etching process. It remains unaffected by the reactive gases and high-energy plasma, ensuring prolonged service life and consistent performance.

●  Thermal Conductivity: The carrier plate features high thermal conductivity to efficiently dissipate heat generated during the etching process. This helps in maintaining optimal temperature control and prevents overheating of the semiconductor wafers.

●  Compatibility: The PSS Etching Carrier Plate is designed to be compatible with various semiconductor wafer sizes commonly used in the industry, ensuring versatility and ease of use across different manufacturing processes.


Product parameter of the PSS Etching Carrier Plate for Semiconductor

Basic physical properties of CVD SiC coating
Property Typical Value
Crystal Structure FCC β phase polycrystalline, mainly (111) oriented
SiC coating Density 3.21 g/cm³
CVD SiC coating Hardness 2500 Vickers hardness(500g load)
Grain Size 2~10 μm
Chemical Purity 99.99995%
Heat Capacity 640 J·kg-1·K-1
Sublimation Temperature 2700 ℃
Flexural Strength 415 MPa RT 4-point
Young's Modulus 430 Gpa 4pt bend, 1300℃
Thermal Conductivity 300W·m-1·K-1
Thermal Expansion(CTE) 4.5×10-6K-1



VeTek Semiconductor PSS Etching Carrier Plate for Semiconductor Production Shop

SiC Graphite substrateCVD TaC coating cover testSilicon carbide ceramic processingEPI process equipment



Overview of the semiconductor chip epitaxy industry chain:

SiC Epitaxy Si Epitaxy GaN Epitaxy

Hot Tags: PSS Etching Carrier Plate for Semiconductor
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