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China Plasma Etching Manufacturer, Supplier, Factory

Our company puts emphasis about the administration, the introduction of talented staff, along with the construction of employees building, seeking hard to boost the standard and liability consciousness of staff members members. Our business successfully attained IS9001 Certification and European CE Certification of Plasma Etching, Quartz Shower Head, Quartz Gas Distribution Plate, Semiconductor CVD, PECVD process, We are going to wholeheartedly welcome all clientele during the industry both of those at your home and overseas to cooperate hand in hand, and build a bright potential together.
Plasma Etching, Further, we're supported by highly experienced and knowledgeable professionals, who have immense expertise in their respective domain. These professionals work in close coordination with each other to provide our clients an effective range of products and solutions.

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  • Monocrystalline pulling Crucible

    Monocrystalline pulling Crucible

    Graphite crucible is an important part of Monocrystalline Pulling Crucibles in the process of achieving monocrystalline silicon ingot growth.Vetek semiconductor's crucibles are intricately engineered to meet the rigorous requirements set by the semiconductor industry.We are committed to producing and supplying crystal growth graphite crucibles that excel in performance, quality, and cost-effectiveness to meet the evolving needs of the industry.Welcome to inquiry us.
  • Silicon Carbide Epitaxy Wafer Carrier

    Silicon Carbide Epitaxy Wafer Carrier

    VeTek Semiconductor is a leading customized Silicon Carbide Epitaxy Wafer Carrier supplier in China.We have been specialized in advanced material more than 20 years.We offer a Silicon Carbide Epitaxy Wafer Carrier for carrying SiC substrate, growing SiC epitaxy layer in SiC epitaxial reactor. This Silicon Carbide Epitaxy Wafer Carrier is an important SiC coated part of halfmoon part, high temperature resistance, oxidation resistance, wear resistance. We welcome you to visit our factory in China.Welcome to consult at any time.
  • 4°off axis p-type SiC Wafer

    4°off axis p-type SiC Wafer

    VeTek Semiconductor is a professional Chinese manufacturer of 4°off axis p-type SiC Wafer. 4°off axis p-type SiC Wafer is a special semiconductor material used in high-performance electronic devices. VeTek Semiconductor is committed to providing advanced solutions for various SiC Wafer products. We sincerely look forward to your further consultation.
  • Semiconductor grade Quartz Bell Jar

    Semiconductor grade Quartz Bell Jar

    Semiconductor grade Quartz Bell Jar is an important equipment component mainly used in high temperature, high pressure and high purity environments. It is made of high purity quartz material, has excellent thermal stability, chemical resistance and optical transparency, and is widely used in industrial fields such as semiconductor manufacturing and LED production. VeTek Semiconductor has many years of process accumulation in Semiconductor grade Quartz Bell Jar and can provide customized products according to customer needs. Looking forward to your inquiry.
  • TaC Coated Deep UV LED Susceptor

    TaC Coated Deep UV LED Susceptor

    TaC coating is a new generation coating develop for harsh environment.VeTek Semiconductor is an integrated supplier engaged in research and development, production, design, and sales of TaC coatings. We specialize in manufacturing edge-cutting TaC Coated UV LED Susceptors, which are crucial components in the LED epitaxy process. Our TaC Coated Deep UV LED Susceptor offer high thermal conductivity, high mechanical strength, improved production efficiency, and epitaxial wafer protection. Welcome to inquiry us.
  • TaC Coating Pedestal Support Plate

    TaC Coating Pedestal Support Plate

    TaC coating can withstand high temperature of 2200℃. Vetek semiconductor provides high purity TaC coating with impurities below 5ppm in China. TaC coating Pedestal support plate is able to withstand ammonia hydrogen, argonin in the epitaxial device reaction chamber.It improves the service life of the product. You provide the requirements, we provide customization.

  • Diamond - the future star of semiconductors

    Diamond, a potential fourth-generation "ultimate semiconductor," is gaining attention in semiconductor substrates due to its exceptional hardness, thermal conductivity, and electrical properties. While its high cost and production challenges limit its use, CVD is the preferred method. Despite doping and large-area crystal challenges, diamond holds promise.

  • The challenges of silicon carbide crystal growth furnaces

    Silicon carbide (SiC) crystal growth furnaces play a vital role in producing high-performance Sic wafers for next-generation semiconductor devices. However, the process of growing high-quality SiC crystals presents significant challenges. From managing extreme thermal gradients to reducing crystal defects, ensuring uniform growth, and controlling production costs, each step requires advanced engineering solutions. This article will analyze the technical challenges of SIC crystal growth furnaces from multiple perspectives.

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  • Intelligent Cutting Technology for Cubic Silicon Carbide Wafers

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  • CVD Technology Innovation Behind the Nobel Prize

    This blog discusses the specific applications of artificial intelligence in the field of CVD from two aspects: The Significance and Challenges of Chemical Vapor Deposition (CVD) Technology in Physics and CVD Technology and Machine Learning.

  • Semiconductor substrate wafer: Material properties of silicon, GaAs, SiC and GaN

    The article analyzes the material properties of semiconductor substrate wafers such as silicon, GaAs, SiC and GaN

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