China Plasma etching Manufacturer, Supplier, Factory

We can constantly satisfy our respected customers with our good high quality, good price tag and good support due to we have been additional specialist and extra hard-working and do it in cost-effective way for Plasma etching, LED lC epitaxy, Single-crystal silicon epitaxy, RTP/TRA wafer carriers, ICP/Pss etching, First company, we understand each other. Further more company, the trust is getting there. Our enterprise normally at your provider anytime.
Plasma etching, Abiding by our motto of "Hold well the quality and services, Customers Satisfaction", So we present our clients with high quality products and excellent service. Make sure you feel free to contact us for further information.

Hot Products

  • CVD SiC Coated Wafer Barrel Holder

    CVD SiC Coated Wafer Barrel Holder

    CVD SiC coated wafer Barrel holder is the key component of epitaxial growth furnace, widely used in MOCVD epitaxial growth furnaces. VeTek Semiconductor provides you with highly customized products. No matter what your needs are for CVD SiC coated wafer Barrel holder, Welcome to consult us.
  • Porous SiC Ceramic Plate

    Porous SiC Ceramic Plate

    Our porous SiC ceramic plates are porous ceramic materials made of silicon carbide as the main component and processed by special processes. They are indispensable materials in semiconductor manufacturing, chemical vapor deposition (CVD) and other processes.
  • Silicon Carbide Shower Head

    Silicon Carbide Shower Head

    Silicon Carbide Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation to us ,vetek semiconductor.
  • CVD SiC Graphite Cylinder

    CVD SiC Graphite Cylinder

    Vetek Semiconductor’s CVD SiC Graphite Cylinder is pivotal in semiconductor equipment, serving as a protective shield within reactors to safeguard internal components in high temperature and pressure settings. It effectively shields against chemicals and extreme heat, preserving equipment integrity. With exceptional wear and corrosion resistance, it ensures longevity and stability in challenging environments. Utilizing these covers enhances semiconductor device performance, prolongs lifespan, and mitigates maintenance requirements and damage risks.Welcome to inquiry us.
  • High purity quartz diffusion Tube

    High purity quartz diffusion Tube

    In process of Semiconductor oxidation and difffusion, high purity quartz diffusion tube is widely used. As a leading manufacturer and supplier of High purity quartz Diffusion Tube in China, VeTek Semiconductor can provide you with high-quality products. Looking forward to your inquiry.
  • SiC Coated ICP Etching Carrier

    SiC Coated ICP Etching Carrier

    Veteksemicon SiC Coated ICP Etching Carrier is designed for the most demanding epitaxy equipment applications. Made of high-quality ultra-pure graphite material, our SiC Coated ICP Etching Carrier has a highly flat surface and excellent corrosion resistance to withstand the harsh conditions during handling. The high thermal conductivity of the SiC coated carrier ensures even heat distribution for excellent etching results.

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