Web Menu

Product Search

Language

Products

China Plasma etching device Manufacturer, Supplier, Factory

Our company puts emphasis about the administration, the introduction of talented staff, along with the construction of employees building, seeking hard to boost the standard and liability consciousness of staff members members. Our business successfully attained IS9001 Certification and European CE Certification of Plasma etching device, Plasma etching equipment, Focus ring plasma etching, Plasma etching process, Vetek plasma etching focus ring, We are going to wholeheartedly welcome all clientele during the industry both of those at your home and overseas to cooperate hand in hand, and build a bright potential together.
Plasma etching device, Our company mission is that providing high quality and beautiful products with reasonable price and strive to gain 100% good reputation from our clients. We believe Profession achieves excellence! We welcome you to cooperate with us and grow up together.

Related Products

Hot Products

  • Semiconductor Quartz Crucible

    Semiconductor Quartz Crucible

    Veteksemicon semiconductor-grade quartz crucibles are key consumables in the Czochralski single crystal growth process. With extreme purity and superior thermal stability as our core focus, we are committed to providing customers with high-quality products that exhibit stable performance and excellent resistance to crystallization under high temperature and high pressure environments. This ensures the quality of the crystal rods from the source, helping semiconductor silicon wafer manufacturing achieve higher yields and better cost-effectiveness.
  • Epi wafer holder

    Epi wafer holder

    VeTek Semiconductor is a professional Epi Wafer Holder manufacturer and factory in China. Epi Wafer Holder is a wafer holder for the epitaxy process in semiconductor processing. It is a key tool to stabilize the wafer and ensure uniform growth of the epitaxial layer. It is widely used in epitaxy equipment such as MOCVD and LPCVD. It is an irreplaceable device in the epitaxy process. Welcome your further consultation.
  • SiC Ceramic Seal Ring

    SiC Ceramic Seal Ring

    As a large-scale factory and supplier of SiC Ceramic Seal Ring products in China, VeTek Semiconductor SiC Ceramic Seal Ring has a wide range of applications in the industrial field due to its excellent thermal conductivity, outstanding chemical and corrosion resistance, and high strength and stiffness. Welcome your further inquiries.
  • SiC Coated Planetary Susceptor

    SiC Coated Planetary Susceptor

    Our SiC Coated Planetary Susceptor is a core component in the high temperature process of semiconductor manufacturing. Its design combines graphite substrate with silicon carbide coating to achieve comprehensive optimization of thermal management performance, chemical stability and mechanical strength.
  • Aixtron MOCVD Susceptor

    Aixtron MOCVD Susceptor

    Vetek Semiconductor's Aixtron MOCVD Susceptor is used in the thin film deposition process of semiconductor production, especially involving MOCVD process. Vetek Semiconductor focuses on manufacturing and supplying high-performance Aixtron MOCVD Susceptor products. Welcome your inquiry.
  • Quartz Gas Distribution Plate

    Quartz Gas Distribution Plate

    The Quartz Shower Head, also known as a Quartz Gas Distribution Plate, is a critical component used in semiconductor thin-film deposition processes such as CVD(Chemical Vapor Deposition), PECVD (Plasma-Enhanced CVD),and ALD (Atomic Layer Deposition). Made from high-purity fused quartz, this component ensures ultra-low contamination and excellent thermal stability, enabling precise gas delivery and uniform film growth across the wafer surface. Looking forward to your further consultation.

  • What is an Electrostatic Chuck (ESC)?

    The electrostatic chuck(ESC), also known as the electrostatic chuck (ESC, e-chuck), is a fixture that uses the principle of electrostatic adsorption to hold and fix the adsorbed material. It is suitable for vacuum and plasma environments.

  • Can Silicon Carbide Ceramics Withstand Extreme Industrial Environments

    At VeTek Semiconductor, we've specialized in pushing the boundaries of what's possible with advanced Silicon Carbide Ceramics, developing grades specifically engineered to thrive where other materials falter.

  • Application and research of silicon carbide ceramics in the field of photovoltaics - Vetek Semiconductor

    With the development of the solar photovoltaic industry, diffusion furnaces and LPCVD furnaces are the main equipment for the production of solar cells, which directly affect the efficient performance of solar cells. Based on the comprehensive product performance and usage cost, silicon carbide ceramic materials have more advantages in the field of solar cells than quartz materials. The application of silicon carbide ceramic materials in the photovoltaic industry can greatly help photovoltaic enterprises reduce auxiliary material investment costs, improve product quality and competitiveness. The future trend of silicon carbide ceramic materials in the photovoltaic field is mainly towards higher purity, stronger load-bearing capacity, higher loading capacity, and lower cost.

  • Why Silicon carbide(SiC) PVT Crystal Growth Cannot Do Without Tantalum Carbide Coatings(TaC)?

    In the process of growing silicon carbide (SiC) crystals via the Physical Vapor Transport (PVT) method, the extreme high temperature of 2000–2500 °C is a “double-edged sword” — while it drives the sublimation and transport of source materials, it also dramatically intensifies impurity release from all materials within the thermal field system, especially trace metallic elements contained in conventional graphite hot-zone components. Once these impurities enter the growth interface, they will directly damage the core quality of the crystal. This is the fundamental reason why tantalum carbide (TaC) coatings have become a “mandatory option” rather than an “optional choice” for PVT crystal growth.

  • Semiconductor process: Chemical Vapor Deposition (CVD)

    Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

  • How much do you know about CVD SiC ? - VeTek Semiconductor

    CVD SiC is a high-purity silicon carbide material manufactured by chemical vapor deposition. It is mainly used for various components and coatings in semiconductor processing equipment. The following content is an introduction to the product classification and core functions of CVD SiC

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept