VeTek Semiconductor specializes in the production of ultra pure Silicon Carbide Coating products, these coatings are designed to be applied to purified graphite, ceramics, and refractory metal components.
Our high purity coatings are primarily targeted for use in the semiconductor and electronics industries. They serve as a protective layer for wafer carriers, susceptors, and heating elements, safeguarding them from corrosive and reactive environments encountered in processes such as MOCVD and EPI. These processes are integral to wafer processing and device manufacturing. Additionally, our coatings are well-suited for applications in vacuum furnaces and sample heating, where high vacuum,
reactive, and oxygen environments are encountered.
At VeTek Semiconductor, we offer a comprehensive solution with our advanced machine shop capabilities. This enables us to manufacture the base components using graphite, ceramics, or refractory metals and apply the SiC or TaC ceramic coatings in-house. We also provide coating services for customer-supplied parts, ensuring flexibility to meet diverse needs.
Our Silicon Carbide Coating products are widely used in Si epitaxy, SiC epitaxy, MOCVD system, RTP/RTA process, etching process, ICP/PSS etching process, process of various LED types, including blue and green LED, UV LED and deep-UV LED etc.,which is adapted to equipment from LPE, Aixtron, Veeco, Nuflare, TEL, ASM, Annealsys, TSI and so on.
Reactor parts we can do:
Key Features
● Ultra-high purity (99.99995%) with dense β-phase polycrystalline structure for minimal particle generation.
● Excellent chemical resistance to HCl, NH₃, H₂, SiH₄ and other corrosive process gases.
● High thermal conductivity (~300 W·m⁻¹·K⁻¹) and thermal stability up to sublimation temperature of 2700°C.
● Superior hardness (2500 Vickers) and strong adhesion to graphite, ceramics and refractory metals.
● Conformal coating coverage suitable for complex geometries including susceptors, carriers, shower heads and heating elements.
● Compatible with major equipment platforms: LPE, Aixtron, Veeco, Nuflare, TEL, ASM, Annealsys, TSI and more.
Silicon Carbide Coating several unique advantages
Product Specifications
VeTek Semiconductor Silicon Carbide Coating Parameter
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Basic physical properties of CVD SiC coating
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Property
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Typical Value
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Crystal Structure
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FCC β phase polycrystalline, mainly (111) oriented
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SiC coating Density
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3.21 g/cm³
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SiC coating Hardness
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2500 Vickers hardness（500g load）
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Grain Size
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2~10μm
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Chemical Purity
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99.99995%
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Heat Capacity
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640 J·kg⁻¹·K⁻¹
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Sublimation Temperature
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2700℃
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Flexural Strength
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415 MPa RT 4-point
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Young's Modulus
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430 GPa 4pt bend, 1300℃
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Thermal Conductivity
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300 W·m⁻¹·K⁻¹
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Thermal Expansion (CTE)
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4.5×10⁻⁶ K⁻¹
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CVD SIC FILM CRYSTAL STRUCTURE
Applications
To meet the diverse needs of semiconductor processes, VeTek offers targeted Silicon Carbide Coating products. The following table classifies them by major application areas, listing typical components and applicable processes:
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Application Field
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Typical Products
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Application Description
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Si Epitaxy
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CVD SiC Coated Graphite Susceptor, SiC Coating Wafer Carrier, Epi susceptor
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Suitable for silicon epitaxial processes, providing uniform temperature distribution, chemical resistance and low particle generation for high-quality epi layers.
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SiC Epitaxy
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CVD SiC Coated Planetary Susceptor, SiC coated wafer susceptor, guide ring
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For high-temperature SiC epitaxial growth (LPE etc.), delivering thermal stability and clean interface to ensure film uniformity and process yield.
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GaN / LED Epitaxy (MOCVD)
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SiC coated Satellite cover, Shower Head, satellite disk, masking ring
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Compatible with Aixtron, Veeco MOCVD systems; resists H₂/NH₃ corrosion, reduces particle contamination and improves LED epi yield (blue, green, UV, deep-UV).
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RTP / RTA Process
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CVD SiC Coated RTP Susceptor, RTP RTA Carrier, heating elements
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Designed for rapid thermal processing and annealing; withstands repeated high-temperature cycling with excellent thermal conductivity and dimensional stability.
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Etching / ICP / PSS
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Solid SiC Focus Rings, SiC coated components for etch chambers
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High hardness and plasma resistance protect chamber parts, ensure etch profile uniformity and extend service life in halogen-rich environments.
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High-Temp Heating & Support
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CVD SiC coating Heating Element, wafer carriers, susceptors
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For induction/resistive heating and vacuum furnace applications; offers high hardness, thermal shock resistance and long component lifespan.
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For more detailed process matching solutions, please refer to the Silicon Epitaxy and Silicon Carbide Epitaxy related application pages.
As a professional Silicon Carbide Coating manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon Carbide Coating made in China, you can leave us a message.
