Silicon Carbide Coating

VeTek Semiconductor specializes in the production of ultra pure Silicon Carbide Coating products, these coatings are designed to be applied to purified graphite, ceramics, and refractory metal components.

Our high purity coatings are primarily targeted for use in the semiconductor and electronics industries. They serve as a protective layer for wafer carriers, susceptors, and heating elements, safeguarding them from corrosive and reactive environments encountered in processes such as MOCVD and EPI. These processes are integral to wafer processing and device manufacturing. Additionally, our coatings are well-suited for applications in vacuum furnaces and sample heating, where high vacuum, reactive, and oxygen environments are encountered.

At VeTek Semiconductor, we offer a comprehensive solution with our advanced machine shop capabilities. This enables us to manufacture the base components using graphite, ceramics, or refractory metals and apply the SiC or TaC ceramic coatings in-house. We also provide coating services for customer-supplied parts, ensuring flexibility to meet diverse needs.

Our Silicon Carbide Coating products are widely used in Si epitaxy, SiC epitaxy, MOCVD system, RTP/RTA process, etching process, ICP/PSS etching process, process of various LED types, including blue and green LED, UV LED and deep-UV LED etc.,which is adapted to equipment from LPE, Aixtron, Veeco, Nuflare, TEL, ASM, Annealsys, TSI and so on.

Reactor parts we can do:

Silicon Carbide Coating several unique advantages:

Silicon Carbide Coating several unique advantages

VeTek Semiconductor Silicon Carbide Coating Parameter

Basic physical properties of CVD SiC coating
Property	Typical Value
Crystal Structure	FCC β phase polycrystalline, mainly (111) oriented
SiC coating Density	3.21 g/cm³
SiC coatingHardness	2500 Vickers hardness（500g load）
Grain SiZe	2~10μm
Chemical Purity	99.99995%
Heat Capacity	640 J·kg^-1·K^-1
Sublimation Temperature	2700℃
Flexural Strength	415 MPa RT 4-point
Young' s Modulus	430 Gpa 4pt bend, 1300℃
Thermal Conductivity	300W·m^-1·K^-1
Thermal Expansion(CTE)	4.5×10-6K^-1

CVD SIC FILM CRYSTAL STRUCTURE

Silicon Carbide coated Epi susceptor SiC Coating Wafer Carrier SiC coated Satellite cover for MOCVD CVD SiC Coating Wafer Epi Susceptor CVD SiC coating Heating Element Aixtron Satellite wafer carrier SiC Coating Epi susceptor SiC coating halfmoon graphite parts

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SiC coated epitaxial reactor chamber

Veteksemicon SiC Coated Epitaxial Reactor chamber is a core component designed for demanding semiconductor epitaxial growth processes. Utilizing advanced chemical vapor deposition (CVD), this product forms a dense, high-purity SiC coating on a high-strength graphite substrate, resulting in superior high-temperature stability and corrosion resistance. It effectively resists the corrosive effects of reactant gases in high-temperature process environments, significantly suppresses particulate contamination, ensures consistent epitaxial material quality and high yield, and substantially extends the maintenance cycle and lifespan of the reaction chamber. It is a key choice for improving the manufacturing efficiency and reliability of wide-bandgap semiconductors such as SiC and GaN.

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EPI Susceptor Parts

In the core process of silicon carbide epitaxial growth, Veteksemicon understands that susceptor performance directly determines the quality and production efficiency of the epitaxial layer. Our high-purity EPI susceptors, designed specifically for the SiC field, utilize a special graphite substrate and a dense CVD SiC coating. With their superior thermal stability, excellent corrosion resistance, and extremely low particle generation rate, they ensure unparalleled thickness and doping uniformity for customers even in harsh high-temperature process environments. Choosing Veteksemicon means choosing the cornerstone of reliability and performance for your advanced semiconductor manufacturing processes.

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SiC coated graphite susceptor for ASM

Veteksemicon SiC coated graphite susceptor for ASM is a core carrier component in semiconductor epitaxial processes. This product utilizes our proprietary pyrolytic silicon carbide coating technology and precision machining processes to ensure superior performance and an ultra-long lifespan in high-temperature and corrosive process environments. We deeply understand the stringent requirements of epitaxial processes on substrate purity, thermal stability, and consistency, and are committed to providing customers with stable, reliable solutions that enhance overall equipment performance.

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Silicon Carbide Focus ring

Veteksemicon focus ring is designed specifically for demanding semiconductor etching equipment, particularly SiC etching applications. Mounted around the electrostatic chuck (ESC), in close proximity to the wafer, its primary function is to optimize the electromagnetic field distribution within the reaction chamber, ensuring uniform and focused plasma action across the entire wafer surface. A high-performance focus ring significantly improves etch rate uniformity and reduces edge effects, directly boosting product yield and production efficiency.

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Silicon Carbide Carrier Plate For LED Etching

Veteksemicon Silicon Carbide Carrier Plate For LED Etching, specifically designed for LED chip manufacturing, is a core consumable in the etching process. Made from precision-sintered high-purity silicon carbide, it offers exceptional chemical resistance and high-temperature dimensional stability, effectively resisting corrosion from strong acids, bases, and plasma. Its low contamination properties ensure high yields for LED epitaxial wafers, while its durability, far exceeding that of traditional materials, helps customers reduce overall operating costs, making it a reliable choice for improving etching process efficiency and consistency.

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Solid SiC Focus Ring

Veteksemi solid SiC focus ring significantly improves etching uniformity and process stability by precisely controlling the electric field and airflow at the wafer edge. It is widely used in precision etching processes for silicon, dielectrics, and compound semiconductor materials, and is a key component for ensuring mass production yield and long-term reliable equipment operation.

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As a professional Silicon Carbide Coating manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon Carbide Coating made in China, you can leave us a message.

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+86-15988690905
Fax
+86-579-87223657
E-mail
anny@veteksemi.com
Address
Wangda Road, Ziyang Street, Wuyi County, Jinhua City, Zhejiang Province, China

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Silicon Carbide Coating

Reactor parts we can do:

Silicon Carbide Coating several unique advantages:

VeTek Semiconductor Silicon Carbide Coating Parameter

CVD SIC FILM CRYSTAL STRUCTURE

SiC coated epitaxial reactor chamber

EPI Susceptor Parts

SiC coated graphite susceptor for ASM

Silicon Carbide Focus ring

Silicon Carbide Carrier Plate For LED Etching

Solid SiC Focus Ring

Send Inquiry

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About Us

Products

Contact Us

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Fax

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