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SiC coated graphite susceptor for ASM
  • SiC coated graphite susceptor for ASMSiC coated graphite susceptor for ASM

SiC coated graphite susceptor for ASM

Veteksemicon SiC coated graphite susceptor for ASM is a core carrier component in semiconductor epitaxial processes. This product utilizes our proprietary pyrolytic silicon carbide coating technology and precision machining processes to ensure superior performance and an ultra-long lifespan in high-temperature and corrosive process environments. We deeply understand the stringent requirements of epitaxial processes on substrate purity, thermal stability, and consistency, and are committed to providing customers with stable, reliable solutions that enhance overall equipment performance.

General product information


Place of Origin:
China
Brand Name:
Veteksemicon
Model Number:
SiC coated graphite susceptor for ASM-01
Certification:
ISO9001


Product business terms


Minimum Order Quantity:
Subject to negotiation
Price:
Contact for Customized Quotation
Packaging Details:
Standard export package
Delivery Time:
Delivery Time: 30-45 Days After Order Confirmation
Payment Terms:
T/T
Supply Ability:
100units/Month


✔ Application: Veteksemicon SiC-coated graphite substrate is a key consumable for the ASM series epitaxial equipment. It directly supports the wafer and provides a uniform and stable thermal field during high-temperature epitaxy, making it a core component for ensuring the high-quality growth of advanced semiconductor materials such as GaN and SiC.

✔ Services that can be provided: customer application scenario analysis, matching materials, technical problem solving. 

✔ Company profile:Veteksemicon has 2 laboratories, a team of experts with 20 years of material experience, with R&D and production, testing and verification capabilities.


Technical Parameters


project
parameter
Applicable models
ASM series epitaxial equipment
Base material
High-purity, high-density isostatic graphite
Coating material
High-purity pyrolytic silicon carbide
Coating thickness
Standard thickness is 80-150 μm (customizable according to customer process requirements)
Surface roughness
The coating surface Ra ≤ 0.5 μm (polishing can be performed according to process requirements)
Consistency Guarantee
Each product undergoes rigorous appearance, dimensional, and eddy current testing before leaving the factory to ensure stable and reliable quality


Veteksemicon SiC coated graphite susceptor for ASM core advantages


1. Extreme purity and low defect rate

Using high-purity, fine-particle-grade special graphite substrate, combined with our strictly controlled chemical vapor deposition (CVD) coating process, we ensure that the coating is dense, free of pinholes, and free of impurities. This significantly reduces the risk of particulate contamination during the epitaxial process, providing a clean substrate environment for the growth of high-quality epitaxial layers.


2. Excellent corrosion resistance and wear resistance

The pyrolytic silicon carbide coating possesses extremely high hardness and chemical inertness, effectively resisting the erosion of silicon sources (such as SiH4, SiHCl3), carbon sources (such as C3H8), and etching gases (such as HCl, H2) at high temperatures. This significantly extends the maintenance cycle of the base and reduces machine downtime caused by component replacement.


3. Excellent thermal uniformity and stability

We optimized the thermal field distribution within the operating temperature range through precise substrate structure design and coating thickness control. This directly translates into excellent thickness and resistivity uniformity in the epitaxial wafer, contributing to improved chip manufacturing yield.


4. Excellent coating adhesion strength

Unique surface pretreatment and gradient coating technology enable the silicon carbide coating to form a strong bonding layer with the graphite substrate, effectively preventing coating peeling, flaking, or cracking problems that may occur during long-term thermal cycling.


5. Precise size and structural replication

We possess mature CNC machining and testing capabilities, enabling us to completely replicate the complex geometry, cavity dimensions, and mounting interfaces of the original base, ensuring perfect matching and plug-and-play functionality with the customer's platform.


6. Ecological chain verification endorsement

Veteksemicon SiC coated graphite susceptor for ASM' ecological chain verification covers raw materials to production, has passed international standard certification, and has a number of patented technologies to ensure its reliability and sustainability in the semiconductor and new energy fields.

For detailed technical specifications, white papers, or sample testing arrangements, please contact our Technical Support Team to explore how Veteksemicon can enhance your process efficiency.


Main application fields


Application direction
Typical scenario
SiC power device manufacturing
In SiC homoepitaxial growth, the substrate directly supports the silicon carbide substrate, facing high temperatures of over 1600°C and a highly etchable gas environment.
Silicon-based RF and power device manufacturing
Used to grow epitaxial layers on silicon substrates, serving as the basis for manufacturing high-end power devices such as insulated gate bipolar transistors (IGBTs), superjunction MOSFETs, and radio frequency (RF) devices.
Third-generation compound semiconductor epitaxy
For example, in GaN-on-Si (gallium nitride on silicon) heteroepitaxial growth, it serves as a key component supporting sapphire or silicon substrates.


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