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Solid SiC Focus Ring

Solid SiC Focus Ring

Veteksemi solid SiC focus ring significantly improves etching uniformity and process stability by precisely controlling the electric field and airflow at the wafer edge. It is widely used in precision etching processes for silicon, dielectrics, and compound semiconductor materials, and is a key component for ensuring mass production yield and long-term reliable equipment operation.

1. General product information

Place of Origin:
China
Brand Name:
Veteksemi
Model Number:
Solid SiC focus ring-01
Certification:
ISO9001

2. Product business terms

Minimum Order Quantity:
Subject to negotiation
Price:
Contact for Customized Quotation
Packaging Details:
Standard export package
Delivery Time:
Delivery Time: 30-45 Days After Order Confirmation
Payment Terms:
T/T
Supply Ability:
100units/Month

3.Application: Veteksemi solid SiC focus ring significantly improves etching uniformity and process stability by precisely controlling the electric field and airflow at the wafer edge. It is widely used in precision etching processes for silicon, dielectrics, and compound semiconductor materials, and is a key component for ensuring mass production yield and long-term reliable equipment operation.

Services that can be provided: customer application scenario analysis, matching materials, technical problem solving.

Company profile:Semixlab has 2 laboratories, a team of experts with 20 years of material experience, with R&D and production, testing and verification capabilities.


4.Description:

Veteksemi solid SiC focus ring is specifically designed for advanced semiconductor etching processes. Precision-manufactured from high-purity silicon carbide, it offers excellent high-temperature resistance, plasma corrosion resistance, and mechanical stability. Suitable for a variety of demanding semiconductor manufacturing environments, this product significantly improves process uniformity, extends equipment maintenance cycles, and reduces overall production costs.

5.Technical Parameters

Project
Parameter
Material
High-purity sintered silicon carbide
Density
≥3.10 g/cm3
Thermal conductivity
120 W/m·K(@25°C)
Coefficient of thermal expansio
4.0×10-6/°C(20-1000°C)
Surface roughness
Ra≤0.5μm (standard), can be customized to 0.2μm
Applicable devices
Applicable to mainstream etching machines such as Applied Materials, Lam Research, and TEL

6.Main application fields

Application direction
Application directionTypical scenario
Semiconductor etching process
Silicon etching, dielectric etching, metal etching, etc
High power device manufacturing
SiC and GaN-based device etching process
Advanced Packaging
Dry Etching Process in Wafer-Level Packaging


7. Veteksemi solid SiC focus ring core advantages


Excellent plasma corrosion resistance

Under prolonged exposure to highly corrosive, high-density plasmas such as CF4, O2, and Cl2, conventional materials are susceptible to rapid wear and particle contamination. Our solid SiC focus ring exhibits excellent corrosion resistance, with a corrosion rate far lower than that of materials like quartz or alumina. This means it maintains a smooth surface over time, significantly reducing the risk of wafer defects caused by component wear and tear, ensuring continuous and stable mass production.


Excellent high temperature stability and thermal management performance

The semiconductor etching process generates significant heat, causing chamber components to experience dramatic temperature fluctuations. Our focus rings have an extremely low coefficient of thermal expansion, capable of withstanding transient temperatures up to 1600°C without cracking or deformation. Furthermore, their inherent high thermal conductivity helps disperse heat evenly and quickly, effectively improving temperature distribution at the wafer edge, thereby enhancing etching uniformity and consistency of critical dimensions across the entire wafer.


Extraordinary material purity and structural density

We strictly control the purity of silicon carbide raw materials (≥99.999%) and eliminate metal contamination during the sintering process to meet the stringent requirements of advanced manufacturing processes for trace impurity control. The dense structure formed through high-temperature sintering has extremely low porosity, almost completely blocking the penetration of process gases and by-products. This prevents performance degradation and particle growth caused by internal material degradation, ensuring a pure process chamber environment.


Long-lasting mechanical life and comprehensive cost-effectiveness

Compared to conventional consumables that require frequent replacement, Veteksemi solid SiC focus rings offer exceptional durability. They maintain stable performance throughout their service life, extending replacement cycles several times. This not only directly reduces spare part procurement costs but also significantly improves machine utilization by reducing equipment downtime for maintenance, resulting in significant overall cost advantages for customers.


Precise size control and flexible customization services

We understand the precise requirements of different machines and processes for consumables. Each focus ring undergoes precision machining and rigorous testing to ensure critical dimensional tolerances within ±0.05mm. We also offer customized services, including custom sizes, surface finishes (polishing to Ra ≤ 0.2μm), and conductivity adjustments to perfectly suit your specific process requirements and application scenarios.


For detailed technical specifications, white papers, or sample testing arrangements, please contact our Technical Support Team to explore how Veteksemi can enhance your process efficiency.





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