SiC Shower Head

VeTek Semiconductor provides advanced SiC Shower Head to the semiconductor industry. Silicon carbide materials have a unique combination of excellent thermal, electrical and chemical properties, making them ideal for applications in the semiconductor industry where high-performance materials are required. VeTek Semiconductor has long accumulated experience in CVD solid SiC technology. VeTek Semiconductor's revolutionary technology enables the production of SiC Shower Head, an ultra-high purity silicon carbide material created through the process of Chemical Vapor Deposition.

The SiC Shower Head is a crucial component in semiconductor manufacturing, specifically designed for MOCVD systems, silicon epitaxy, and SiC epitaxy processes. Made from robust solid silicon carbide (SiC), this component can withstand the extreme conditions of plasma processing and high-temperature applications.

Silicon carbide (SiC) is known for its high thermal conductivity, chemical corrosion resistance, and exceptional mechanical strength, making it an ideal material for bulk SiC components like the SiC Shower Head. The gas shower head ensures even distribution of process gases over the wafer surface, which is essential for producing high-quality epitaxial layers. Focus rings and edge rings, often made from CVD-SiC, maintain uniform plasma distribution and protect the chamber from contamination, enhancing the efficiency and yield of epitaxial growth.

With its precise gas flow control and outstanding material properties, the SiC Shower Head is a key component in modern semiconductor processing, supporting advanced applications in silicon epitaxy and SiC epitaxy.

VeTek Semiconductor offers a low resistivity sintered silicon carbide semiconductor shower head. We have the capability to custom engineer and supply advanced ceramic materials utilizing a variety of unique capabilities.