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China solid SiC Manufacturer, Supplier, Factory

"Control the standard by the details, show the energy by quality". Our business has strived to establish a really efficient and stable personnel team and explored an effective high quality manage process for solid SiC, Solid SiC wafer carrier, SiC wafer carrier, CVD TaC Coating Wafer Carrier, TaC Coated Graphite Wafer Carrier, We're going to empower people by communicating and listening, Setting an example to others and learning from experience.
solid SiC, We integrate all our advantages to continuously innovate, improve and optimize our industrial structure and product performance. We are going to always believe in and work on it. Welcome to join us to promote green light, together we'll make a better Future!

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Hot Products

  • Graphite Disc Susceptor

    Graphite Disc Susceptor

    Vetek Semiconductor provide edge-cutting Graphite Disc Susceptor. The SiC coating provides superior thermal stability, excellent chemical resistance, and enhanced process uniformity, ensuring optimal performance and reliability. Experience the next level of efficiency and precision with Vetek Semiconductor's SiC-coated Disc Susceptor.
  • Porous Ceramic Vacuum Chuck

    Porous Ceramic Vacuum Chuck

    Vetek Semiconductor's Porous Ceramic Vacuum Chuck is made of silicon carbide ceramic (SiC) material, which has excellent high temperature resistance, chemical stability and mechanical strength. It is an indispensable core component in the semiconductor process. Welcome your further inquiries.
  • Rapid Thermal Annealing Susceptor

    Rapid Thermal Annealing Susceptor

    VeTek Semiconductor is a leading Rapid Thermal Annealing Susceptor manufacturer and supplier in China, focusing on providing high-performance solutions for the semiconductor industry. We have many years of deep technical accumulation in the field of SiC coating materials. Our Rapid Thermal Annealing Susceptor has excellent high temperature resistance and excellent thermal conductivity to meet the needs of wafer epitaxial manufacturing. You are welcome to visit our factory in China to learn more about our technology and products.
  • Pull Silicon Single Crystal Jig

    Pull Silicon Single Crystal Jig

    Pull Silicon Single Crystal Jig is designed to ensure the purity of wafers and precise control of hot zones during crystallization, offering sustainable and efficient solutions for the photovoltaic industry.Veteksemicon is looking forward to setting long-term cooperation with you.
  • High Pure Silicon Carbide Wafer Carrier

    High Pure Silicon Carbide Wafer Carrier

    VeTek Semiconductor High Pure Silicon Carbide Wafer Carrier are important components in semiconductor processing, designed to safely hold and transport delicate silicon wafers, playing a key role in all stages of manufacturing. VeTek Semiconductor's High Pure Silicon Carbide Wafer Carrier are carefully designed and manufactured to ensure excellent performance and reliability. VeTek Semiconductor is committed to providing quality products at competitive prices, and we look forward to being your long-term partner in China.Feel free to inquire us.
  • SiC Coated Support for LPE PE2061S

    SiC Coated Support for LPE PE2061S

    VeTek Semiconductor is a leading manufacturer and supplier of SiC Coated graphite components in China. SiC Coated Support for LPE PE2061S is suitable for LPE silicon epitaxial reactor. As the bottom of the barrel base, SiC Coated Support for LPE PE2061S can withstand high temperatures of 1600 degrees Celsius, thereby achieving ultra-long product life and reducing customer costs. Looking forward to your inquiry and further communication.

  • What is hot pressed SiC ceramics?

    Hot pressing sintering is the main method for preparing high-performance SiC ceramics. The process of hot pressing sintering includes: selecting high-purity SiC powder, pressing and molding under high temperature and high pressure, and then sintering. SiC ceramics prepared by this method have the advantages of high purity and high density, and are widely used in grinding discs and heat treatment equipment for wafer processing.

  • What is an Electrostatic Chuck (ESC)?

    In the high-stakes world of semiconductor fabrication, precision and stability are everything—and that's where the Electrostatic Chuck (ESC) steps in. Far more than just a holding tool, the ESC uses electrostatic forces to securely clamp wafers during critical processes like etching, deposition, and ion implantation. But how does it actually work? Why is it superior to traditional mechanical clamping? And what role does it play in achieving nanoscale accuracy and throughput efficiency? Welcome to read.

  • What is Tantalum Carbide TaC Coating? - Veteksemicon

    This article introduces the product characteristics of TaC coating, the specific process of preparing TaC coating products using CVD technology, introduces Veteksemicon's most popular TaC coating, and briefly analyzes the reasons for choosing Veteksemicon.

  • What measurement equipment are there in the Fab factory? - VeTek semiconductor

    There are many types of measurement equipment in the Fab factory. Common equipment includes lithography process measurement equipment, etching process measurement equipment, thin film deposition process measurement equipment, doping process measurement equipment, CMP process measurement equipment, wafer particle detection equipment and other measurement equipment.

  • How does CMP Technology Reshape the Landscape of Chip Manufacturing

    Over the past few years, the center stage of packaging technology has gradually been ceded to a seemingly "old technology" - CMP (Chemical Mechanical Polishing). When Hybrid Bonding becomes the leading role of the new generation of advanced packaging, CMP is gradually moving from behind the scenes to the spotlight.

  • Summary of Silicon Carbide (SiC) Manufacturing Process

    Silicon carbide abrasives are typically produced using quartz and petroleum coke as primary raw materials. In the preparatory stage, these materials undergo mechanical processing to achieve the desired particle size before being chemically proportioned into furnace charge.

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