Chemical Vapor Deposition Process Solid SiC Edge Ring

CVD Process Solid SiC Edge Ring:

●  Material: The focusing ring is fabricated from solid SiC, a high purity and high-performance ceramic material. It is Prepared by chemical vapor deposition. The solid SiC material provides exceptional durability, high-temperature resistance, and excellent mechanical properties.

●  Advantages: The cvd sic ring offers outstanding thermal stability, maintaining its structural integrity even under high-temperature conditions encountered in dry etch processes. Its high hardness ensures resistance to mechanical stress and wear, leading to extended service life. Moreover, solid SiC exhibits chemical inertness, protecting it from corrosion and maintaining its performance over time.

CVD SiC Coating:

●  Material: CVD SiC coating is a thin film deposition of SiC using chemical vapor deposition (CVD) techniques. The coating is applied onto a substrate material, such as graphite or silicon, to provide SiC properties to the surface.

●  Comparison: While CVD SiC coatings offer some advantages, such as conformal deposition on complex shapes and tunable film properties, they may not match the robustness and performance of solid SiC. The coating thickness, crystalline structure, and surface roughness can vary based on the CVD process parameters, potentially impacting the coating's durability and overall performance.

In summary, VeTek Semiconductor solid SiC focusing ring is an exceptional choice for dry etch applications. Its solid SiC material ensures high-temperature resistance, excellent hardness, and chemical inertness, making it a reliable and long-lasting solution. While CVD SiC coating offers flexibility in deposition, the cvd sic ring excels in providing unmatched durability and performance required for demanding dry etch processes.

Physical properties of Solid SiC