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China Chemical Vapor Deposition Manufacturer, Supplier, Factory

Quality comes first; service is foremost; business is cooperation" is our business philosophy which is constantly observed and pursued by our company for Chemical Vapor Deposition, Semiconductor Quartz Screen, MOCVD, Thin Film Growth, Quartz Parts, Welcome your visiting and any your inquires,sincerely hope we can have chance to cooperate with you and we can build up long well business relationship with you.
Chemical Vapor Deposition, With the support of our highly experienced professionals, we manufacture and supply best quality goods. These are quality tested at various occasions to ensure only flawless range is delivered to customers, we also customize the array as per the have to have of customers to meet the requirement of customers.

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  • SiC Ceramic Seal Ring

    SiC Ceramic Seal Ring

    As a large-scale factory and supplier of SiC Ceramic Seal Ring products in China, VeTek Semiconductor SiC Ceramic Seal Ring has a wide range of applications in the industrial field due to its excellent thermal conductivity, outstanding chemical and corrosion resistance, and high strength and stiffness. Welcome your further inquiries.
  • Ion Beam Sputter sources grid

    Ion Beam Sputter sources grid

    Ion beam is mainly used for ion etching, ion coating and plasma injection. The role of the Ion Beam Sputter sources grid is to dissect the ions and accelerate them to the required energy. Vetek Semiconductor provides high purity graphite ion beam Ion Beam Sputter sources grid for optical lens ion beam polishing, semiconductor wafer modification, etc. Welcome to inquire about customized products.
  • Carbon Carbon Composite PECVD Pallet

    Carbon Carbon Composite PECVD Pallet

    VeTek Semiconductor has been focusing on the research and development and production of carbon-based materials for many years. Our Carbon Carbon Composite PECVD Pallet is made of high-density carbon fiber, which has excellent high temperature resistance, good mechanical properties and excellent chemical stability, and plays an irreplaceable role in the photovoltaic PECVD process. We look forward to your inquiry and establishing a long-term strategic partnership with you to jointly promote technological progress and industrial development.
  • TaC Coating Spare Part

    TaC Coating Spare Part

    TaC Coating is currently mainly used in processes such as silicon carbide single crystal growth (PVT method), epitaxial disk (including silicon carbide epitaxy, LED epitaxy), etc. Combined with the good long-term stability of TaC Coating Plate, Veteksemicon's TaC Coating Plate has become the benchmark for TaC Coating spare parts. We look forward to you becoming our long-term partner.
  • SiC Diffusion Furnace Tube

    SiC Diffusion Furnace Tube

    As a leading manufacturer and supplier of diffusion furnace equipment in China, VeTek Semiconductor SiC Diffusion Furnace Tube has significantly high bending strength, excellent resistance to oxidation, corrosion resistance, high wear resistance, and excellent high-temperature mechanical properties. Making it an indispensable equipment material in diffusion furnace applications. VeTek Semiconductor is committed to manufacturing and supplying high-quality SiC Diffusion Furnace Tube, and welcomes your further inquiries.
  • SiC Coating Collector Center

    SiC Coating Collector Center

    VeTek Semiconductor is a manufacturer reputable for CVD SiC coating in China, brings you the cutting-edge SiC Coating Collector Center in Aixtron G5 MOCVD system. These SiC Coating Collector Center are meticulously designed with high purity graphite and boast an advanced CVD SiC coating, ensuring high temperature stability, corrosion resistance, high purity.Looking forward to cooperating with you!

  • 8-inch SiC epitaxial furnace and homoepitaxial process research

    8-inch SiC epitaxial furnace and homoepitaxial process research

  • Why is SiC coating a key core material for SiC epitaxial growth?

    This article analyzes the reasons why SiC coating a key core material for SiC epitaxial growth and focuses on the specific advantages of SiC coating in the semiconductor industry.

  • Characteristics of silicon epitaxy

    High purity: The silicon epitaxial layer grown by chemical vapor deposition (CVD) has extremely high purity, better surface flatness and lower defect density than traditional wafers.

  • How does SiC coating improve the oxidation resistance of carbon felt？

    The article describes the excellent physical properties of Carbon felt, the specific reasons for choosing SiC coating, and the method and principle of SiC coating on carbon felt. It also specifically analyzes the use of D8 ADVANCE X-ray diffractometer (XRD) to analyze the phase composition of SiC coating carbon felt.

  • Research on SIC Wafer Carrier Technology

    ​SiC wafer carriers, as key consumables in the third-generation semiconductor industry chain, their technical characteristics directly affect the yield of epitaxial growth and device manufacturing. With the surging demand for high-voltage and high-temperature devices in industries such as 5G base stations and new energy vehicles, the research and application of SiC wafer carriers are now facing significant development opportunities.

  • What is CVD TAC Coating? - Veteksemi

    CVD TAC coating is a process for forming a dense and durable coating on a substrate (graphite). This method involves depositing TaC onto the substrate surface at high temperatures, resulting in a tantalum carbide (TaC) coating with excellent thermal stability and chemical resistance.

Related Search

Chemical Vapor Deposition (CVD)Chemical Vapor Deposition (CVD) processChemical Vapor deposition (CVD) reactorChemical Vapor Deposition PROCESSChemical vapor deposition susceptorCVD chemical vapor depositionhigh-temperature chemical vapor deposition (HTCVD)Low Pressure Chemical Vapor Deposition (LPCVD)metal organic chemical vapor deposition (MOCVD)MOCVD (metal organic chemical vapor deposition) equipmentPECVD (Plasma-Enhanced Chemical Vapor Deposition)

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