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China CVD chemical vapor deposition Manufacturer, Supplier, Factory

We often persist with the theory "Quality To start with, Prestige Supreme". We are fully committed to delivering our clientele with competitively priced good quality items, prompt delivery and experienced support for CVD chemical vapor deposition, Focus ring, Etching ring, Focus ring for etching, Monocrystalline silicon focusing ring, Our corporation is dedicated to giving customers with superior and secure excellent items at competitive rate, creating just about every customer content with our services and products.
CVD chemical vapor deposition, Our next goal is to exceed the expectations of every client by offering outstanding customer service, increased flexibility and greater value. All in all, without our customers we do not exist; without happy and fully satisfied customers, we fail. We have been looking for the wholesale, Drop ship. Please contact us if you are interesting our items. Hope to do business with you all. High quality and fast shipment!

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  • AMAT 0200-03201 CVD SiC Wafer Lift Pin

    AMAT 0200-03201 CVD SiC Wafer Lift Pin

    This AMAT 0200-03201 Wafer Lift Pin from VeTek starts with high-purity graphite, then we add a dense CVD SiC coating on top. It’s made for 300mm epitaxy systems and Applied Materials EPI reactors. Why graphite and SiC? Graphite handles heat really well. The SiC layer takes on corrosive gases and doesn’t wear out fast. The thin wall design? That’s for cleaner wafer lifting and positioning, fewer particles, and longer part life under high temperatures. We also make similar SiC coated graphite parts for ASM, Aixtron, and LPE systems. Looking forward to your inquiry.
  • Graphite Heating Unit

    Graphite Heating Unit

    VeTek Semiconductor Graphite Heating Unit is a high-performance industrial heating solution made of high-purity graphite material, which can provide precise and efficient heating effect. Graphite Heating Unit is widely used in semiconductor, electronics, ceramics and other fields. Welcome your further inquiry.
  • Tantalum Carbide Guide Ring

    Tantalum Carbide Guide Ring

    VeTek Semiconductor is a professional manufacturer and leader of Tantalum Carbide Guide Ring products in China. Our Tantalum Carbide (TaC) Guide Ring is a high-performance ring component made of tantalum carbide, which is commonly used in semiconductor processing equipment, especially in high-temperature and highly corrosive environments such as CVD, PVD, etching and diffusion. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry, and welcomes your further inquiries.
  • Porous TaC Coated Graphite Ring

    Porous TaC Coated Graphite Ring

    The porous TaC coated graphite ring produced by VETEK uses a lightweight porous graphite substrate and is coated with a high-purity tantalum carbide coating, featuring excellent resistance to high temperatures, corrosive gases and plasma erosion
  • High purity CVD SiC raw material

    High purity CVD SiC raw material

    High purity CVD SiC raw material prepared by CVD is the best source material for silicon carbide crystal growth by physical vapor transport. The density of High purity CVD SiC raw material supplied by VeTek Semiconductor is higher than that of small particles formed by spontaneous combustion of Si and C-containing gases, and it does not require a dedicated sintering furnace and has a nearly constant evaporation rate. It can grow extremely high quality SiC single crystals. Looking forward to your inquiry.
  • CVD TAC Coating

    CVD TAC Coating

    VeTek Semiconductor is china leading CVD TAC Coating products manufacturer. For many years, we have been focusing on various CVD TAC Coating products like CVD TaC coating cover, CVD TaC Coating Ring. VeTek Semiconductor supports customized product services and satisfactory product prices, and looks forward to your further consultation.
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  • MOCVD SiC Coated Graphite Susceptor Cracking Analysis & Thermal Stress Optimization Case Study

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  • The Problems in the Etching Process

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