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Dependable high-quality and fantastic credit standing are our principles, which will help us at a top-ranking position. Adhering to your tenet of "quality very first, client supreme" for Etching ring, Focus ring, Focus ring for etching, Monocrystalline silicon focusing ring, CVD chemical vapor deposition, We welcome new and previous consumers from all walks of lifestyle to speak to us for upcoming business enterprise associations and mutual results!
Etching ring, We're sticking to excellent quality, competitive price and punctual delivery and better service, and sincerely hope to establish long-term good relationships and cooperation with our new and old business partners from all over the world. Sincerely welcome you to join us.

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  • SiC coated graphite susceptor for ASM

    SiC coated graphite susceptor for ASM

    Veteksemicon SiC coated graphite susceptor for ASM is a core carrier component in semiconductor epitaxial processes. This product utilizes our proprietary pyrolytic silicon carbide coating technology and precision machining processes to ensure superior performance and an ultra-long lifespan in high-temperature and corrosive process environments. We deeply understand the stringent requirements of epitaxial processes on substrate purity, thermal stability, and consistency, and are committed to providing customers with stable, reliable solutions that enhance overall equipment performance.
  • Si EPI Susceptor

    Si EPI Susceptor

    China top factory-Vetek Semiconductor combines precision machining and semiconductor SiC and TaC coating capabilities. The barrel type Si Epi Susceptor provides temperature and atmosphere control capabilities, enhancing production efficiency in semiconductor epitaxial growth processes.Looking forward to setting up cooperation relationship with you.
  • SiC Coated Support for LPE PE2061S

    SiC Coated Support for LPE PE2061S

    VeTek Semiconductor is a leading manufacturer and supplier of SiC Coated graphite components in China. SiC Coated Support for LPE PE2061S is suitable for LPE silicon epitaxial reactor. As the bottom of the barrel base, SiC Coated Support for LPE PE2061S can withstand high temperatures of 1600 degrees Celsius, thereby achieving ultra-long product life and reducing customer costs. Looking forward to your inquiry and further communication.
  • TaC Coating Crucible

    TaC Coating Crucible

    As a professional TaC Coating Crucible Supplier and Manufacturer in China, VeTek Semiconductor's TaC Coating Crucible plays an irreplaceable role in the Single crystal growth process of semiconductors with its excellent thermal conductivity, outstanding chemical stability and enhanced corrosion resistance. Welcome your further inquiries.
  • SiC Wafer Boat

    SiC Wafer Boat

    The SiC wafer boat is used to carry the wafer,mainly for the oxidation and diffusion process, to ensure that the temperature can be evenly distributed on the wafer surface. The high temperature stability and high thermal conductivity of SiC materials ensure efficient and reliable semiconductor processing. Vetek semiconductor is committed to providing quality products at competitive prices.
  • GaN on SiC epi susceptor

    GaN on SiC epi susceptor

    GaN on SiC epi susceptor plays a vital role in semiconductor processing through its excellent thermal conductivity, high temperature processing ability and chemical stability, and ensures the high efficiency and material quality of the GaN epitaxial growth process. VeTek Semiconductor is a China professional manufacturer of GaN on SiC epi susceptor ,We sincerely look forward to your further consultation.

  • What measurement equipment are there in the Fab factory? - VeTek semiconductor

    There are many types of measurement equipment in the Fab factory. Common equipment includes lithography process measurement equipment, etching process measurement equipment, thin film deposition process measurement equipment, doping process measurement equipment, CMP process measurement equipment, wafer particle detection equipment and other measurement equipment.

  • What challenges does the CVD TaC coating process for SiC single crystal growth face in semiconductor processing?

    The article analyzes the specific challenges faced by the CVD TaC coating process for SiC single crystal growth during semiconductor processing, such as material source and purity control, process parameter optimization, coating adhesion, equipment maintenance and process stability, environmental protection and cost control, as well as the corresponding industry solutions.

  • What is a quartz boat?

    Quartz Boat is a key load-bearing component used in the semiconductor manufacturing process. It is mainly used for high-temperature processing of wafers, such as diffusion, oxidation and annealing. Its excellent thermal stability, low pollution characteristics and corrosion resistance make it an indispensable material in the semiconductor industry. This article will elaborate on the material, physical properties, classification, application scenarios of quartz boat and its differences from PECVD graphite boat.

  • Is Porous Graphite The Key To Faster Charging Batteries

    We’ve all felt that moment of panic. Your phone battery is at 5%, you have minutes to spare, and every second plugged in feels like an eternity. What if the secret to ending this anxiety lies not in a completely new chemistry, but in reimagining a fundamental material within the battery itself? For two decades at the forefront of tech, I’ve seen trends come and go. But the buzz around Porous Graphite feels different. It isn't just an incremental step; it represents a fundamental shift in how we approach energy storage design.

  • What is the difference between CVD TaC and sintered TaC?

    This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

  • What are the differences between MBE and MOCVD technologies?

    This article mainly discusses the respective process advantages and differences of Molecular Beam Epitaxy process and Metal-organic chemical vapour deposition technologies.

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