Aixtron G5+ ceiling component
  • Aixtron G5+ ceiling componentAixtron G5+ ceiling component

Aixtron G5+ ceiling component

VeTek Semiconductor has become a supplier of consumables for many MOCVD equipment with its superior processing capabilities. Aixtron G5+ ceiling component is one of our latest products, which is almost the same as the original Aixtron component and has received good feedback from customers. If you need such products, please contact VeTek Semiconductor!

Gallium nitride (GaN) is a wide bandgap semiconductor material with excellent physical properties such as high electron mobility, high breakdown electric field, and high saturation electron velocity. It is widely used in optoelectronic devices (such as light-emitting diodes, laser diodes) and high-frequency high-power electronic devices (such as power amplifiers). Silicon (Si) is a commonly used semiconductor substrate material with the advantages of low cost, large size, and compatibility with existing silicon-based integrated circuit processes. Therefore, growing GaN epitaxial layers on Si is a very valuable research topic. The Aixtron G5+ series is one of the hottest Si-based GaN epitaxial growth equipment at present, which has many important components, and the ceiling component is one of the important components.


Aixtron G5+ ceiling working diagram

The Aixtron G5+ ceiling component is made of SGL graphite. The main function is to control the temperature and ensure the lowest heat flow through the wafer.


  Temperature uniformity control: 

The Aixtron G5+ ceiling component helps to achieve uniform temperature distribution throughout the reaction chamber. In the semiconductor epitaxial growth process, temperature uniformity is crucial for growing high-quality epitaxial layers. It ensures that the same surface temperature can be obtained on all wafers or satellite components, thereby ensuring the consistency of the growth rate and quality of the epitaxial material at all locations, thereby improving the process yield.


 Optimize the growth environment: 

As part of the reaction chamber, the Aixtron G5+ ceiling component forms a stable growth environment together with other components. It can reduce heat loss and make the temperature in the reaction chamber more stable, which is conducive to accurately controlling the conditions for epitaxial growth and reducing epitaxial layer defects and performance non-uniformity caused by temperature fluctuations.


Aixtron G5+ ceiling component is one of the mainstream products in the industry launched by VeTek Semiconductor. Choosing VeTek semiconductor means partnering with a company committed to pushing the boundaries of silicon carbide coating innovation. With a strong emphasis on quality, performance, and customer satisfaction, we deliver products that not only meet but exceed the rigorous demands of the semiconductor industry. Let us help you achieve greater efficiency, reliability, and success in your operations with our advanced Aixtron G5+ ceiling component solutions.

Material data of SGL 6510 graphite:

Typical properties
Units
Test standards
Values
Average grain size
μm
ISO 13320
10
Bulk density
g/cm3
DIN IEC 60413/204
1.83
Open porosity
Vol.%
DIN 66133
10
Medium pore entrance diameter
μm
DIN 66133
1.8
Coefficient of permeability(ambient temperature)
cm2/s
DIN 51935
0.06
Rockwell hardness HR5/100
\ DIN IEC 60413/303
90
Resistivity
μΩm
DIN IEC 60413/402
13
Flexural strength
MPa
DIN IEC 60413/501
60
Compressive strength
MPa
DIN 51910
130
Dynamic modulus of elasticit
MPa
DIN 51915
11.5 x 103
Thermal expansion(20-200℃)
K-1
DIN 51909
4.2x10-6
Thermal conductivity(20℃)
Wm-1K-1
DIN 51908
105
Ash content
ppm
DIN 51903
\

VeTek semiconductor Aixtron G5+ ceiling component products shops

Semiconductor process equipmentSiC Coating Wafer CarrierCVD SiC Focus RingOxidation and Diffusion Furnace Equipment


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