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China Plasma Resistant Component Manufacturer, Supplier, Factory

Assume full responsibility to satisfy all needs of our clients; achieve continual advancements by endorsing the expansion of our purchasers; turn into the final permanent cooperative partner of clientele and maximize the interests of clients for Plasma Resistant Component, Solid SiC Focus Ring, SiC Focus Ring, Silicon Carbide Focus Ring, Semiconductor Focus Ring, Customers' profit and pleasure are constantly our biggest goal. You should contact us. Give us a probability, offer you a surprise.
Plasma Resistant Component, In order to meet our market demands, we now have paied more attention to the quality of our products and solutions and services. Now we can meet customers' special requirements for special designs. We persistently develop our enterprise spirit "quality lives the enterprise, credit assures cooperation and keep the motto in our minds: customers first.

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  • SiC Ceramic vacuum chuck for wafer

    SiC Ceramic vacuum chuck for wafer

    Veteksemicon SiC Ceramic Vacuum Chuck for Wafer is engineered to deliver exceptional precision and reliability in semiconductor wafer processing. Manufactured from high-purity silicon carbide, it ensures excellent thermal conductivity, chemical resistance, and superior mechanical strength, making it ideal for demanding applications such as etching, deposition, and lithography. Its ultra-flat surface guarantees stable wafer support, minimizing defects and improving process yield. this vacuum chuck is the trusted choice for high-performance wafer handling.
  • SiC coated wafer carrier

    SiC coated wafer carrier

    As a leading SiC coated wafer carrier supplier and manufacturer in China, VeTek Semiconductor's SiC coated wafer carrier is made of high-quality graphite and CVD SiC coating, which has super stability and can work for a long time in most epitaxial reactors. VeTek Semiconductor has industry-leading processing capabilities and can meet customers' various customized requirements for SiC coated wafer carriers. VeTek Semiconductor looks forward to establishing a long-term cooperative relationship with you and growing together.
  • PSS Etching Carrier Plate for Semiconductor

    PSS Etching Carrier Plate for Semiconductor

    VeTek Semiconductor's PSS Etching Carrier Plate for Semiconductor is a high-quality, ultra-pure graphite carrier designed for wafer handling processes. Our carriers have excellent performance and can perform well in harsh environments, high temperatures and harsh chemical cleaning conditions. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.You are welcome to come to China to visit our factory and learn more about our technology and products.
  • Semiconductor thermal spraying technology

    Semiconductor thermal spraying technology

    Vetek Semiconductor Semiconductor thermal spraying technology is an advanced process that sprays materials in a molten or semi-molten state onto the surface of a substrate to form a coating. This technology is widely used in the field of semiconductor manufacturing, mainly used to create coatings with specific functions on the surface of the substrate, such as conductivity, insulation, corrosion resistance, and oxidation resistance. The main advantages of thermal spraying technology include high efficiency, controllable coating thickness, and good coating adhesion, making it particularly important in the semiconductor manufacturing process that requires high precision and reliability. Looking forward to your inquiry.
  • Tantalum Carbide Coated Halfmoon Part for LPE

    Tantalum Carbide Coated Halfmoon Part for LPE

    VeTek Semiconductor is a leading supplier of Tantalum Carbide Coated Halfmoon Part for LPE in China, focusing on TaC coating technology for many years. Our Tantalum Carbide Coated Halfmoon Part for LPE is designed for liquid phase epitaxy process and can withstand high temperature of over 2000 degrees Celsius. With excellent material performance and process innovation, our product life is at the leading level in the industry. VeTek Semiconductor looks forward to being your long-term partner in China.
  • SiC coated Wafer Holder

    SiC coated Wafer Holder

    VeTek Semiconductor is a professional manufacturer and leader of SiC coated wafer holder products in China. SiC coated wafer holder is a wafer holder for the epitaxy process in semiconductor processing. It is an irreplaceable device that stabilizes the wafer and ensures the uniform growth of the epitaxial layer. Welcome your further consultation.

  • From the manufacturing process of electrostatic suction cups to mass production manufacturers

    The Dechuck principle of the Electrostatic Chuck is a key part of its workflow that involves electrostatic force elimination and wafer release mechanisms.

  • Research on SIC Wafer Carrier Technology

    ​SiC wafer carriers, as key consumables in the third-generation semiconductor industry chain, their technical characteristics directly affect the yield of epitaxial growth and device manufacturing. With the surging demand for high-voltage and high-temperature devices in industries such as 5G base stations and new energy vehicles, the research and application of SiC wafer carriers are now facing significant development opportunities.

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

  • How does SiC coating improve the oxidation resistance of carbon felt？

    The article describes the excellent physical properties of Carbon felt, the specific reasons for choosing SiC coating, and the method and principle of SiC coating on carbon felt. It also specifically analyzes the use of D8 ADVANCE X-ray diffractometer (XRD) to analyze the phase composition of SiC coating carbon felt.

  • The Problems in the Etching Process

    Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

  • What is High-purity porous graphite?

    What is High-purity porous graphite ? - Vetek , This blog mainly introduces the specific working principle of High-purity porous graphite for SiC single crystal growth by PVT method.

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