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Silicon Carbide Focus ring
  • Silicon Carbide Focus ringSilicon Carbide Focus ring

Silicon Carbide Focus ring

Veteksemicon focus ring is designed specifically for demanding semiconductor etching equipment, particularly SiC etching applications. Mounted around the electrostatic chuck (ESC), in close proximity to the wafer, its primary function is to optimize the electromagnetic field distribution within the reaction chamber, ensuring uniform and focused plasma action across the entire wafer surface. A high-performance focus ring significantly improves etch rate uniformity and reduces edge effects, directly boosting product yield and production efficiency.

General product information

Place of Origin:
China
Brand Name:
Veteksemicon
Model Number:
SiC Focus ring-01
Certification:
ISO9001


Product business terms

Minimum Order Quantity:
Subject to negotiation
Price:
Contact for Customized Quotation
Packaging Details:
Standard export package
Delivery Time:
Delivery Time: 30-45 Days After Order Confirmation
Payment Terms:
T/T
Supply Ability:
500units/Month


Application: In semiconductor dry etching processes, the focus ring is a key component that ensures process uniformity. It tightly surrounds the wafer and, by precisely controlling the distribution of plasma at the wafer edges, directly determines the uniformity and consistency of the etching process, making it an indispensable part of guaranteeing chip yield.


Services that can be provided: customer application scenario analysis, matching materials, technical problem solving.


Company profile:Veteksemicon has 2 laboratories, a team of experts with 20 years of material experience, with R&D and production, testing and verification capabilities.


Technical Parameters

project
parameter
Main Materials
High Purity Sintered SiC
Optional materials
Coated SiC can be customized according to customer requirements
Applicable processes
SiC etching, Si deep etching, other compound semiconductor etching
Applicable devices
Applicable to mainstream dry etching equipment platforms (specific models can be customized)
Key dimensions
Customized according to customer's equipment model and drawing requirements
Surface roughness
Ra ≤ 0.2 μm (can be adjusted according to process requirements)
Key Features
High corrosion resistance, high purity, high hardness, excellent thermal stability, and low particle formation


Veteksemicon focus ring core advantages


1. Exceptional materials science, born for harsh environments


Our selected high-purity, high-density silicon carbide material can easily withstand the intense plasma bombardment and fluorine-containing chemical gas corrosion during the SiC etching process. Its excellent corrosion resistance directly translates into a longer service life and lower component replacement frequency, not only reducing equipment downtime but also significantly reducing the risk of particle contamination caused by component wear, providing you with long-term and stable comprehensive cost-effectiveness.


2. Precise engineering design ensures consistent process


Each Veteksemicon focus ring undergoes ultra-precision CNC machining to ensure that key dimensions such as flatness, inner diameter, and step height achieve micron-level accuracy, ensuring perfect matching with the original equipment manufacturer (OEM). Our engineering team further optimizes the profile using plasma simulation. This design effectively guides the electric field, reducing abnormal etching at the wafer edges and thus controlling the etching uniformity of the entire wafer to an extreme level.


3. Reliable performance improves production efficiency


In demanding mass production environments, the full value of our products is realized. By ensuring concentrated and stable plasma distribution, the Veteksemicon focus ring directly contributes to improved etching rate uniformity and optimized batch-to-batch process repeatability. This means your production line can consistently deliver high-yield products, while also benefiting from longer maintenance cycles, effectively reducing consumable costs per wafer and giving you a significant competitive edge.


4. Ecological chain verification endorsement


Veteksemicon focus ring' ecological chain verification covers raw materials to production, has passed international standard certification, and has a number of patented technologies to ensure its reliability and sustainability in the semiconductor and new energy fields.


For detailed technical specifications, white papers, or sample testing arrangements, please contact our Technical Support Team to explore how Veteksemicon can enhance your process efficiency.


Main application fields

Application direction
Typical scenario
SiC power device manufacturing
Gate and mesa etching of MOSFET, SBD, IGBT and other devices.
GaN-on-SiC RF devices
Etching process for high-frequency, high-power radio frequency devices.
MEMS device deep etching
Micro-electromechanical system processing that has extremely high requirements on etching morphology and uniformity.


Veteksemicon products shop

Veteksemicon products shop


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