Graphite boat for PECVD

Application: Veteksemicon graphite boat for PECVD is a core component in the plasma-enhanced chemical vapor deposition process. It is designed specifically for depositing high-quality silicon nitride, silicon oxide and other thin films on silicon wafers, compound semiconductors and display panel substrates. Its performance directly determines the film uniformity, process stability and production cost.

Services that can be provided: customer application scenario analysis, matching materials, technical problem solving.

Company profile：Veteksemicon has 2 laboratories, a team of experts with 20 years of material experience, with R&D and production, testing and verification capabilities.

General product information

Product business terms

Main application fields

Veteksemicon Graphite boat for PECVD core advantages

1. High-purity substrates, controlling pollution from the source

We insist on using isostatically pressed high-purity graphite with a stable purity of over 99.995% as the base material to ensure that it will not precipitate metal impurities even in a continuous operating environment of 1600°C. This stringent material requirement can directly avoid wafer performance degradation caused by carrier contamination, providing the most fundamental guarantee for depositing high-quality silicon nitride or silicon oxide films.

2. Precise thermal field and structural design to ensure process uniformity

Through extensive fluid simulation and process measurement data, we have optimized the boat's slot angle, guide groove depth, and gas flow path. This meticulous structural consideration enables uniform distribution of reactive gases between wafers. Actual measurements show that at full load, the uniformity deviation of film thickness between wafers in the same batch can be stably controlled within ±1.5%, significantly improving product yield.

3. Customized coating solutions to address specific process corrosion

To meet the different process gas environments of different customers, we offer two mature coating options: pyrolytic carbon and silicon carbide. If you mainly deposit silicon nitride and use hydrogen cleaning, the dense pyrolytic carbon coating can provide excellent resistance to hydrogen plasma erosion. If your process involves fluorine-containing cleaning gases, then the high-hardness silicon carbide coating is a better choice. It can extend the service life of the graphite boat in highly corrosive environments to more than three times that of ordinary uncoated products.

4. Excellent thermal shock stability, adaptable to frequent temperature cycles

Thanks to our unique graphite formula and internal reinforcement rib design, our graphite boats can withstand the repeated rapid cooling and heating shocks of the PECVD process. In rigorous laboratory tests, after 500 rapid thermal cycles from room temperature to 800°C, the boat's flexural strength retention rate still exceeded 90%, effectively avoiding cracking caused by thermal stress and ensuring production continuity and safety.

5. Ecological chain verification endorsement

Veteksemicon Graphite boat for PECVD' ecological chain verification covers raw materials to production, has passed international standard certification, and has a number of patented technologies to ensure its reliability and sustainability in the semiconductor and new energy fields.

For detailed technical specifications, white papers, or sample testing arrangements, please contact our Technical Support Team to explore how Veteksemicon can enhance your process efficiency.