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China Plasma etching (ICP/RIE) process Manufacturer, Supplier, Factory

We have a highly efficient team to deal with inquiries from customers. Our goal is "100% customer satisfaction by our product quality, price & our team service" and enjoy a good reputation among clients. With many factories, we can provide a wide range of Plasma etching (ICP/RIE) process, GaN wafer etching process, Gallium nitride (GaN), Etching process, SiC coated E-Chuck, As an experienced group we also accept custom-made orders. The main intention of our firm is to build up a satisfying memory for all consumers, and set up a long-term win-win small business connection.
Plasma etching (ICP/RIE) process, With the effort to keep pace with world's trend, we will always endeavor to meet customers' demands. If you want develop any other new solutions, we can customize them for you personally. If you feel interest in any of our products or want develop new merchandise, remember to feel free to contact us. We have been looking forward to forming successful business relationship with customers all over the world.

Hot Products

  • C/C Composite Crucible

    C/C Composite Crucible

    Designed for the harsh environment of silicon single crystal production, the C/C Composite Crucible is an indispensable component of the semiconductor silicon single crystal production process.
  • SiC Coated Graphite Barrel Susceptor for EPI

    SiC Coated Graphite Barrel Susceptor for EPI

    The barrel type epitaxial wafer heating base is a product with complicated processing technology, which is very challenging to machining equipment and ability. Vetek semiconductor has advanced equipment and rich experience in processing SiC coated graphite barrel susceptor for EPI, can provide the same as the original factory life, more cost-effective epitaxial barrels.If you are interested in our datas,pls no hesitate to contact us.
  • MOCVD SiC coating susceptor

    MOCVD SiC coating susceptor

    VeTek Semiconductor is a leading manufacturer and supplier of MOCVD SiC coating susceptors in China, focusing on the R&D and production of SiC coating products for many years. Our MOCVD SiC coating susceptors have excellent high temperature tolerance, good thermal conductivity, and low thermal expansion coefficient, playing a key role in supporting and heating silicon or silicon carbide (SiC) wafers and uniform gas deposition. Welcome to consult further.
  • CVD SiC coated wafer susceptor

    CVD SiC coated wafer susceptor

    Veteksemicon’s CVD SiC coated wafer susceptor is a cutting-edge solution for semiconductor epitaxial processes, offering ultra-high purity (≤100ppb, ICP-E10 certified) and exceptional thermal/chemical stability for contamination-resistant growth of GaN, SiC, and silicon-based epi-layers. Engineered with precision CVD technology, it supports 6”/8”/12” wafers, ensures minimal thermal stress, and withstands extreme temperatures up to 1600°C.
  • CVD SiC Coated Wafer Barrel Holder

    CVD SiC Coated Wafer Barrel Holder

    CVD SiC coated wafer Barrel holder is the key component of epitaxial growth furnace, widely used in MOCVD epitaxial growth furnaces. VeTek Semiconductor provides you with highly customized products. No matter what your needs are for CVD SiC coated wafer Barrel holder, Welcome to consult us.
  • Pyrolytic Graphite Coated Graphite Elements

    Pyrolytic Graphite Coated Graphite Elements

    VeTek Semiconductor is a leading supplier of customized Pyrolytic Graphite Coated Graphite Elements in China. The Pyrolytic Graphite Coated Graphite Elements we provide have a dense surface structure, high purity and good high temperature resistance. VeTek Semiconductor is committed to establishing long-term strategic partnerships with customers to promote technological innovation and industrial development.

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