Quartz Gas Distribution Plate

Quartz gas distribution plates, also known as quartz showerheads, are critical components in semiconductor fabrication. Leveraging the exceptional purity, high-temperature resistance, and corrosion resistance of quartz, these plates ensure a uniform and stable flow of process gases onto the wafer surface. This precise delivery is essential for maintaining the quality and uniformity of deposited films or etched features.

Key Features of High-purity fused quartz

●Material: 99.99%High-Purity Fused Quartz

●High Temperature Resistance: Withstands temperatures above 1000℃

●Corrosion Resistance: Excellent durability against process gases and plasma environments

●Precision Gas Flow: Uniform micro-hole distribution for optimal gas delivery and deposition uniformity

●Customizable Design: Size, hole pattern, and mounting features can be tailored for specific equipment models

Core roles in semiconductor manufacturing

1. Physical Vapor Deposition (PVD) & Chemical Vapor Deposition (CVD)

Role: In PVD and CVD processes, the gas distribution plate precisely directs reactive gases (e.g., silane, ammonia, oxygen) or precursors onto the wafer to form a desired thin film.

Specific Uses:

●Uniformity Control: The plate's precisely engineered micro-holes ensure that the gas flow and concentration are uniform across the entire wafer surface. This is vital for depositing films with consistent thickness and performance.

●Contamination Prevention: The high purity of quartz prevents the plate from reacting with process gases or releasing impurities. This maintains the film's purity and prevents defects on the wafer surface.

2. Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Role: In PECVD, the quartz showerhead not only delivers reactive gases but also functions as an electrode for plasma generation.

Specific Uses:

●Plasma Ignition: The showerhead is typically connected to a radio-frequency (RF) power source to generate a plasma. High-energy particles within the plasma promote the decomposition of gaseous reactants, enabling film deposition at lower temperatures.

●Thermal Stability: Quartz exhibits excellent thermal stability, allowing it to withstand the high-temperature plasma environment. This helps maintain a uniform temperature within the process chamber, further ensuring film quality and consistency.

3. Dry Etching

Role: In dry etching, the gas distribution plate introduces reactive etching gases (e.g., fluorocarbons, chlorine) into the etch chamber.

Specific Uses:

●Etch Uniformity: The plate ensures a uniform flow and concentration of etch gases, which guarantees consistent etch depth and profile across the entire wafer. This is crucial for achieving the precise patterns required for advanced semiconductor devices.

●Corrosion Resistance: The strong corrosive properties of etch gases necessitate a durable material. Quartz's high corrosion resistance extends the showerhead's lifespan and reduces the risk of process interruptions.

4. Wafer Cleaning

Role: In specific wafer cleaning processes, a quartz gas distribution plate is used to deliver cleaning gases (e.g., ozone, ammonia) uniformly to the wafer surface to remove residues or contaminants.

Specific Uses:

●Consistent Cleaning: The plate ensures that cleaning gases reach every part of the wafer, enabling a thorough and uniform cleaning process.

●Chemical Compatibility: Quartz's compatibility with a wide range of cleaning chemicals prevents reactions and maintains the purity and effectiveness of the cleaning process.