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China Wafer processing Manufacturer, Supplier, Factory

We know that we only thrive if we can guarantee our combined price competiveness and quality advantageous at the same time for Wafer processing, Silicon Carbide SiC wafer boat, High Purity SiC wafer boat, Silicon Carbide wafer boat, SiC-coated graphite boat, We will endeavor to maintain our great reputation as the best products supplier in the world. If you have any questions or comments, please contact with us freely.
Wafer processing, We focus on providing service for our clients as a key element in strengthening our long-term relationships. Our continual availability of high grade solutions in combination with our excellent pre-sale and after-sales service ensures strong competitiveness in an increasingly globalized market. We have been willing to cooperate with business friends from at home and abroad and create a great future together.

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  • CVD SiC coating Heating Element

    CVD SiC coating Heating Element

    CVD SiC coating Heating Element plays a core role in heating materials in PVD furnace (Evaporation Deposition). VeTek Semiconductor is a leading CVD SiC coated Heating Element manufacturer in China. We have advanced CVD coating capabilities and can provide you with customized CVD SiC coating products. VeTek Semiconductor looks forward to becoming your partner in SiC coated Heating Element.
  • High purity CVD SiC raw material

    High purity CVD SiC raw material

    High purity CVD SiC raw material prepared by CVD is the best source material for silicon carbide crystal growth by physical vapor transport. The density of High purity CVD SiC raw material supplied by VeTek Semiconductor is higher than that of small particles formed by spontaneous combustion of Si and C-containing gases, and it does not require a dedicated sintering furnace and has a nearly constant evaporation rate. It can grow extremely high quality SiC single crystals. Looking forward to your inquiry.
  • 4°off axis p-type SiC Wafer

    4°off axis p-type SiC Wafer

    VeTek Semiconductor is a professional Chinese manufacturer of 4°off axis p-type SiC Wafer. 4°off axis p-type SiC Wafer is a special semiconductor material used in high-performance electronic devices. VeTek Semiconductor is committed to providing advanced solutions for various SiC Wafer products. We sincerely look forward to your further consultation.
  • silicon carbide ceramic coating graphite heater

    silicon carbide ceramic coating graphite heater

    VeTek semiconductor's Silicon Carbide Ceramic Coating Graphite Heater is a high-performance heater made of graphite substrate and coated with silicon carbon ceramic (SiC) coating on its surface. With its composite material design, this product provides excellent heating solutions in semiconductor manufacturing. Welcome your inquiry.
  • Wafer Lift Pin

    Wafer Lift Pin

    VeTek Semiconductor is a leading EPI Wafer Lift Pin manufacturer and innovator in China.We have been specialized in SiC coating on surface of graphite for many years. We offer a EPI Wafer Lift Pin for Epi process. With high quality and competitive price,we welcome you to visit our factory in China.
  • Vitreous Carbon Coated Graphite Crucible for E-beam Gun

    Vitreous Carbon Coated Graphite Crucible for E-beam Gun

    VeTek Semiconductor is a leading supplier of customized Vitreous Carbon Coated Graphite Crucible for E-beam Gun in China, specializing in advanced materials for many years. Our Vitreous Carbon Coated Graphite Crucible is specifically designed for E-beam Gun, ensuring excellent performance. Made from ultra-pure imported SGL graphite, it offers reliability and durability. Visit our factory in China to explore deep cooperation.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

  • Semiconductor substrate wafer: Material properties of silicon, GaAs, SiC and GaN

    The article analyzes the material properties of semiconductor substrate wafers such as silicon, GaAs, SiC and GaN

  • What is The Third-generation Semiconductor Industry?

    Semiconductor materials can be classified into three generations in chronological order. The first generation consists of common elemental materials such as germanium and silicon, which are characterized by convenient switching and are generally used in integrated circuits. The second-generation compound semiconductors such as gallium arsenide and indium phosphide are mainly used in luminescent and communication materials.

  • A complete explanation of the chip manufacturing process (2/2): from wafer to packaging and testing

    Thin film deposition is vital in chip manufacturing, creating micro devices by depositing films under 1 micron thick via CVD, ALD, or PVD. These processes build semiconductor components through alternating conductive and insulating films.

  • What is the temperature gradient of the thermal field of a single crystal furnace?

    The article explains the temperature gradient in a single-crystal furnace. It covers the static and dynamic heat fields during crystal growth, the solid-liquid interface, and the temperature gradient's role in solidification.

  • What is a Quartz Thermos Bucket?

    In the ever-evolving world of home and kitchen appliances, one product has recently gained significant attention for its innovation and practical application—the Quartz Thermos Bucket

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