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China 300mm Epitaxy Parts Manufacturer, Supplier, Factory

We emphasize advancement and introduce new products and solutions into the market each year for 300mm Epitaxy Parts, AMAT 0200-03201, Wafer Lift Pin, Thin Wall SiC Coated Graphite, CVD SiC Coating, We look ahead to receiving your enquires quickly and hope to have the chance to get the job done together with you inside the future. Welcome to get a seem at our organization.
300mm Epitaxy Parts, Customer's satisfaction is always our quest, creating value for customers is always our duty, a long term mutual-beneficial business relationship is what we're doing for. We have been an absolutely reliable partner for you personally in China. Of course, other services, like consulting, can be offered too.

Hot Products

  • Contiguous Wafer Boat

    Contiguous Wafer Boat

    Vetek Semiconductor Contiguous Wafer Boat is an advanced equipment for semiconductor processing. The product structure is carefully designed to ensure efficient processing and production of precision wafers. VeTekSemi supports customized product solutions and looks forward to your consultation.
  • SiC Coating Set Disc

    SiC Coating Set Disc

    VeTek Semiconductor is top manufacturer of CVD SiC coatings in China, offers SiC Coating Set Disc in Aixtron MOCVD Reactors. These SiC Coating Set Disc are crafted using high purity graphite and feature a CVD SiC coating with impurity below 5ppm. Your inquiry is welcomed.
  • CVD SiC Coating Baffle

    CVD SiC Coating Baffle

    Vetek's CVD SiC Coating Baffle is mainly used in Si Epitaxy. It is usually used with silicon extension barrels. It combines the unique high temperature and stability of the CVD SiC Coating Baffle, which greatly improves the uniform distribution of airflow in semiconductor manufacturing. We believe that our products can bring you Advanced Technology and High-Quality Product Solutions.
  • CVD TaC Coated Graphite Ring

    CVD TaC Coated Graphite Ring

    The CVD TaC Coated Graphite Ring by Veteksemicon is engineered to meet the extreme demands of semiconductor wafer processing. Utilizing Chemical Vapor Deposition (CVD) technology, a dense and uniform Tantalum Carbide (TaC) coating is applied to high-purity graphite substrates, achieving exceptional hardness, wear resistance, and chemical inertness. In semiconductor fabrication, the CVD TaC Coated Graphite Ring is widely used in MOCVD, etching, diffusion, and epitaxial growth chambers, serving as a key structural or sealing component for wafer carriers, susceptors, and shielding assemblies. Looking forward to your further consultation.
  • PSS Etching Carrier Plate for Semiconductor

    PSS Etching Carrier Plate for Semiconductor

    VeTek Semiconductor's PSS Etching Carrier Plate for Semiconductor is a high-quality, ultra-pure graphite carrier designed for wafer handling processes. Our carriers have excellent performance and can perform well in harsh environments, high temperatures and harsh chemical cleaning conditions. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.You are welcome to come to China to visit our factory and learn more about our technology and products.
  • CVD Silicon Carbide(SiC) Coated Graphite Shower Head

    CVD Silicon Carbide(SiC) Coated Graphite Shower Head

    If you’ve ever dealt with uneven gas flow or particle contamination in a deposition chamber, the VETEK CVD SiC Coated Graphite Shower Head is designed to solve that. It starts with high‑purity isostatic graphite for thermal stability and easy machining, then gets a dense CVD Silicon Carbide (SiC) coating that seals the surface, resists corrosive gases (like HCl or NF₃), and prevents outgassing. The result is a gas distribution plate that delivers uniform flow across the wafer, handles high‑temperature epitaxy, and lasts far longer than bare graphite or quartz – making it a trusted component for CVD, PECVD, MOCVD, silicon epitaxy, and SiC epitaxy processes. We also offer custom hole patterns and sizes, because no two reactors are exactly the same.

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