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Solid Silicon Carbide

VeTek Semiconductor Solid Silicon Carbide is an important ceramic component in plasma etching equipment, solid silicon carbide(CVD silicon carbide) parts in the etching equipment include focusing rings, gas showerhead, tray, edge rings, etc. Due to the low reactivity and conductivity of solid silicon carbide(CVD silicon carbide) to chlorine - and fluorine-containing etching gases, it is an ideal material for plasma etching equipment focusing rings and other components.


For example, the focus ring is an important part placed outside the wafer and in direct contact with the wafer, by applying a voltage to the ring to focus the plasma passing through the ring, thereby focusing the plasma on the wafer to improve the uniformity of processing. The traditional focus ring is made of silicon or quartz, conductive silicon as a common focus ring material, it is almost close to the conductivity of silicon wafers, but the shortage is poor etching resistance in fluorine-containing plasma, etching machine parts materials often used for a period of time, there will be serious corrosion phenomenon, seriously reducing its production efficiency.


Solid SiC Focus Ring Working Principle：

Working Principle of Solid SiC Focus Ring


Comparison of Si Based Focusing Ring and CVD SiC Focusing Ring：

Comparison of Si Based Focusing Ring and CVD SiC Focusing Ring
Item Si CVD SiC
Density (g/cm3) 2.33 3.21
Band gap (eV) 1.12 2.3
Thermal conductivity (W/cm℃) 1.5 5
CTE (x10-6/℃) 2.6 4
Elastic modulus (GPa) 150 440
Hardness (GPa) 11.4 24.5
Resistance to wear and corrosion Poor Excellent


VeTek Semiconductor offers advanced solid silicon carbide (CVD silicon carbide) parts like SiC focusing rings for semiconductor equipment. Our solid silicon carbide focusing rings outperform traditional silicon in terms of mechanical strength, chemical resistance, thermal conductivity, high-temperature durability, and ion etching resistance.


Key features of our SiC focusing rings include:

High density for reduced etching rates.

Excellent insulation with a high bandgap.

High thermal conductivity and low coefficient of thermal expansion.

Superior mechanical impact resistance and elasticity.

High hardness, wear resistance, and corrosion resistance.

Manufactured using plasma-enhanced chemical vapor deposition (PECVD) techniques, our SiC focusing rings meet the increasing demands of etching processes in semiconductor manufacturing. They are designed to withstand higher plasma power and energy, specifically in capacitively coupled plasma (CCP) systems.

VeTek Semiconductor's SiC focusing rings provide exceptional performance and reliability in semiconductor device manufacturing. Choose our SiC components for superior quality and efficiency.


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Chemical Vapor Deposition Process Solid SiC Edge Ring

Chemical Vapor Deposition Process Solid SiC Edge Ring

VeTek Semiconductor has always been committed to the research and development and manufacturing of advanced semiconductor materials. Today, VeTek Semiconductor has made great progress in Chemical Vapor Deposition Process Solid SiC Edge Ring products and is able to provide customers with highly customized solid SiC edge rings. Solid SiC edge rings provide better etching uniformity and precise wafer positioning when used with an electrostatic chuck, ensuring consistent and reliable etching results. Looking forward to your inquiry and becoming each other's long-term partners.
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Solid SiC Etching Focusing Ring

Solid SiC Etching Focusing Ring

Solid SiC Etching Focusing Ring is one of the core components of wafer etching process, which plays a role in fixing wafer, focusing plasma and improving wafer etching uniformity. As the leading SiC Focusing Ring manufacturer in China, VeTek Semiconductor has advanced technology and mature process, and manufactures Solid SiC Etching Focusing Ring that fully meets the needs of end customers according to customer requirements. We look forward to your inquiry and becoming each other's long-term partners.
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Veteksemicon solid silicon carbide is the ideal procurement material for high-temperature, high-strength, and corrosion-resistant components used in semiconductor and industrial applications. As a fully dense, monolithic ceramic, solid silicon carbide (SiC) offers unmatched mechanical rigidity, extreme thermal conductivity, and exceptional chemical durability in harsh processing environments. Veteksemicon’s solid SiC is specifically developed for critical structural applications such as SiC wafer carriers, cantilever paddles, susceptors, and showerheads in semiconductor equipment.


Manufactured through pressureless sintering or reaction bonding, our solid silicon carbide parts exhibit excellent wear resistance and thermal shock performance, even at temperatures above 1600°C. These properties make solid SiC the preferred material for CVD/PECVD systems, diffusion furnaces, and oxidation furnaces, where long-term thermal stability and purity are essential.


Veteksemicon also offers custom-machined SiC parts, enabling tight dimensional tolerances, high surface quality, and application-specific geometries. Additionally, solid SiC is non-reactive in both oxidizing and reducing atmospheres, enhancing its suitability for plasma, vacuum, and corrosive gas environments.


To explore our full range of solid silicon carbide components and discuss your project specifications, please visit the Veteksemicon product detail page or contact us for technical support and quotations.


As a professional Solid Silicon Carbide manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Solid Silicon Carbide made in China, you can leave us a message.
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