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CVD SiC Coated Graphite Shower Head
  • CVD SiC Coated Graphite Shower HeadCVD SiC Coated Graphite Shower Head

CVD SiC Coated Graphite Shower Head

The CVD SiC Coated Graphite Shower Head from Veteksemicon is a high-performance component specifically designed for semiconductor chemical vapor deposition (CVD) processes. Manufactured from high-purity graphite and protected with a chemical vapor deposition (CVD) silicon carbide (SiC) coating, this shower head delivers outstanding durability, thermal stability, and resistance to corrosive process gases. Looking forward to your further consultation.

Veteksemicon CVD SiC Coated Graphite Shower Head, Its precision-engineered surface ensures uniform gas distribution, which is critical for achieving consistent film deposition across wafers. The SiC coating not only enhances wear resistance and oxidation resistance, but also extends service life under harsh process conditions.


Widely applied in semiconductor wafer fabrication, epitaxy, and thin-film deposition, the CVD SiC Coated Graphite Shower Head is an ideal choice for manufacturers seeking reliable, high-purity, and long-lasting process components that meet the demands of next-generation semiconductor production.


Veteksemi CVD Silicon Carbide Showerhead is manufactured from high-purity chemical vapor deposited silicon carbide and is optimized for CVD and MOCVD processes in the semiconductor, LED, and advanced electronics industries. Its outstanding thermal stability, corrosion resistance, and uniform gas distribution ensure long-term stable operation in high-temperature, highly corrosive environments, significantly improving process repeatability and yield.


Veteksemicon CVD SiC Coated Graphite Shower Head core advantages


Ultra-high purity and density

The CVD SiC Coated Graphite Shower Head is manufactured using a high-purity CVD process, ensuring a material purity of ≥99.9995%, eliminating any metallic impurities. Its non-porous structure effectively prevents gas permeation and particle shedding, making it ideal for semiconductor epitaxy and advanced packaging processes requiring extremely high cleanliness. Compared to traditional sintered SiC or graphite components, our product maintains stable performance even after prolonged high-temperature operation, reducing maintenance frequency and production costs.


Excellent thermal stability

In high-temperature CVD and MOCVD processes, conventional materials are susceptible to deformation or cracking due to thermal stress. The CVD SiC Showerhead withstands temperatures up to 1600°C and features an extremely low coefficient of thermal expansion, ensuring structural stability during rapid temperature increases and decreases. Its uniform thermal conductivity further optimizes temperature distribution within the reaction chamber, minimizing deposition rate differences between the wafer edge and center, and improving film uniformity.


Anti-plasma corrosion

During etching or deposition processes, highly corrosive gases (such as CF4, Cl2, and HBr) rapidly erode conventional quartz or graphite components. The CVD SiC material exhibits exceptional corrosion resistance in plasma environments, with a lifespan 3-5 times that of conventional materials. Actual customer testing has shown that even after 2000 hours of continuous operation, pore size variation remains within ±1%, ensuring long-term stable gas flow distribution.


Long life and low maintenance cost

While traditional graphite components require frequent replacement, the CVD Shower Head With SiC Coated maintains stable performance even in harsh environments. This reduces overall costs by over 40%. Furthermore, the material's high mechanical strength prevents accidental damage during handling or installation.


Ecological chain verification endorsement

Veteksemicon CVD Silicon Carbide Showerhead' ecological chain verification covers raw materials to production, has passed international standard certification, and has a number of patented technologies to ensure its reliability and sustainability in the semiconductor and new energy fields.


Technical Parameters

Project
Parameter
Material
CVD SiC (coating options available)
Diameter range
100mm-450mm (customizable)
Thickness tolerance
±0.05mm
Surface roughness
≤0.2μm
Applicable process
CVD/MOCVD/PECVD/Etching/Epitaxy


Main Application Fields

Application direction
Typical scenario
Semiconductor manufacturing
Silicon epitaxy, GaN/GaAs devices
Power Electronics
SiC epitaxial wafer production
LED
MOCVD sapphire substrate deposition
Scientific research equipment
High-precision thin film deposition system


Ecological chain verification endorsement

Veteksemicon CVD Silicon Carbide Showerhead' ecological chain verification covers raw materials to production, has passed international standard certification, and has a number of patented technologies to ensure its reliability and sustainability in the semiconductor and new energy fields.


For detailed technical specifications, white papers, or sample testing arrangements, please contact our Technical Support Team to explore how Veteksemicon can enhance your process efficiency.


Veteksemicon Warehouse


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