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China SiC Coated Semiconductor Parts Manufacturer, Supplier, Factory

Our products are broadly regarded and reliable by end users and can meet up with constantly transforming financial and social requires of SiC Coated Semiconductor Parts, CVD SiC Coated Graphite Shower Head, Silicon Carbide Shower Head, Graphite Shower Head for Semiconductor, CVD Silicon Carbide Shower head, For further info, you should usually do not hesitate to call us. All inquiries from you might be extremely appreciated.
SiC Coated Semiconductor Parts, At existing our sales network is growing continually, improving service quality to meet customer's demand. If you are interested in any goods , be sure to contact us at anytime. We have been looking forward to forming successful business relationships with you in near future.

Hot Products

  • AMAT Cover Top Quartz 8 inch PCII

    AMAT Cover Top Quartz 8 inch PCII

    The AMAT Cover Top Quartz 8" PCII (0200-00218) is a high-purity quartz component designed for Applied Materials Endura PVD chambers, delivering excellent contamination control, plasma stability, and extended service life. Engineered for 200mm semiconductor processes, it serves as a critical protective and insulating element in the chamber top region, helping improve yield and process consistency. Vetek Semiconductor offers precision-manufactured, OEM-compatible quartz parts with reliable performance and global supply capability. We welcome your inquiry.
  • CVD SiC Coated Skirt

    CVD SiC Coated Skirt

    VeTek Semiconductor is a leading manufacturer and leader of CVD SiC Coated Skirt in China. Our main CVD SiC coating products include CVD SiC coated Skirt, CVD SiC Coating Ring. Looking forward to your contact.
  • Quartz Gas Distribution Plate

    Quartz Gas Distribution Plate

    The Quartz Shower Head, also known as a Quartz Gas Distribution Plate, is a critical component used in semiconductor thin-film deposition processes such as CVD(Chemical Vapor Deposition), PECVD (Plasma-Enhanced CVD),and ALD (Atomic Layer Deposition). Made from high-purity fused quartz, this component ensures ultra-low contamination and excellent thermal stability, enabling precise gas delivery and uniform film growth across the wafer surface. Looking forward to your further consultation.
  • CVD Silicon Carbide (SiC) Coated Graphite RTP RTA Carrier

    CVD Silicon Carbide (SiC) Coated Graphite RTP RTA Carrier

    The VETEK CVD Silicon Carbide (SiC) Coated Graphite RTP RTA Carrier is designed for rapid thermal processing (RTP) and rapid thermal annealing (RTA) systems used in semiconductor manufacturing. Manufactured from high-purity isostatic graphite with a dense CVD SiC coating, it provides outstanding thermal stability, excellent temperature uniformity, superior chemical resistance, and ultra-low particle generation. Engineered to withstand repeated rapid heating and cooling cycles, the carrier ensures reliable wafer support and stable process performance for silicon wafer annealing and other high-temperature semiconductor applications.
  • Upper Halfmoon Part SiC Coated

    Upper Halfmoon Part SiC Coated

    VeTek Semiconductor is a leading supplier of customized Upper Halfmoon Part SiC coated in China, specializing in advanced materials for over 20 years. VeTek Semiconductor Upper Halfmoon Part SiC coated is specifically designed for SiC epitaxial equipment, serving as a crucial component in the reaction chamber. Made from ultra-pure, semiconductor-grade graphite, it ensures excellent performance. We invite you to visit our factory in China.Welcome to consult at any time.
  • SiC coated epitaxial reactor chamber

    SiC coated epitaxial reactor chamber

    Veteksemicon SiC Coated Epitaxial Reactor chamber is a core component designed for demanding semiconductor epitaxial growth processes. Utilizing advanced chemical vapor deposition (CVD), this product forms a dense, high-purity SiC coating on a high-strength graphite substrate, resulting in superior high-temperature stability and corrosion resistance. It effectively resists the corrosive effects of reactant gases in high-temperature process environments, significantly suppresses particulate contamination, ensures consistent epitaxial material quality and high yield, and substantially extends the maintenance cycle and lifespan of the reaction chamber. It is a key choice for improving the manufacturing efficiency and reliability of wide-bandgap semiconductors such as SiC and GaN.

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