ALD Susceptor

As a professional ALD Susceptor manufacturer in China, our product ALD Susceptor's precise temperature control, uniform gas distribution and excellent thermal conductivity and other product characteristics determine that ALD Susceptor plays a crucial role in the atomic layer deposition (ALD) process. Important role, welcome your consultation.

Uniform thin film deposition:ALD Susceptor ensures uniform deposition of atomic layers over the entire wafer surface during the atomic layer deposition (ALD) process. Its unique rotating design allows gases and reactants to evenly contact the wafer surface, resulting in uniform film thickness. This is critical for high-precision semiconductor manufacturing.

Improve deposition quality: By optimizing temperature control and gas distribution, the ALD Susceptor significantly improves film quality and performance, reducing defects and non-uniformity. This makes it ideal for high-precision semiconductor and electronic device manufacturing, ensuring product reliability and performance.

Supports multi-wafer processing:Certain ALD Susceptor designs allow multiple wafers to be processed simultaneously, increasing production efficiency. This is especially important for high-throughput manufacturing environments, capable of meeting the needs of large-scale production.

Accommodates different sizes and types of wafers:ALD Susceptors are generally designed for high compatibility and can support different sizes and types of wafers. This makes it effective in a variety of production processes, providing greater flexibility and adaptability.

Reduce production costs:Due to its efficient gas distribution and uniform heating capabilities, the ALD Susceptor increases the efficiency of the deposition process, thereby reducing material waste and production costs. This not only helps improve production efficiency but also significantly reduces manufacturing costs.

Basic physical properties of CVD SiC coating:

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Overview of the semiconductor chip epitaxy industry chain：