SiC Edge Ring

SiC Edge Ring

Veteksemicon High-purity SiC edge rings, specially designed for semiconductor etching equipment, feature outstanding corrosion resistance and thermal stability, significantly enhancing wafer yield

In the field of semiconductor manufacturing, SiC edge rings, as core components of wafer processing equipment, are revolutionizing the industrial landscape with their material properties. The value of this precision component made of silicon carbide single crystals lies not only in its high-tech content, but also in the significant improvement in yield and optimization of operating costs that it can bring to chip manufacturers.


SiC Edge Ring Structural Characteristics


Silicon carbide Edge rings  are key consumable components in semiconductor etching equipment and are made of high-purity silicon carbide materials prepared by the chemical vapor deposition (CVD) method. The diameter of its annular structure is usually 200-450mm, and the thickness is controlled within 5-15mm, featuring the following characteristics:

1.Extreme tolerance: Can withstand a high-temperature environment of 1500℃

2. Plasma stability: Dielectric constant 9.7, breakdown voltage 3MV/cm

3. Geometric accuracy: Roundness error ≤0.05mm, surface roughness Ra<0.2μm


Breakthrough in manufacturing process

The modern preparation process adopts a three-stage method:

1. Matrix forming: Isostatic pressing forming ensures uniform density

2. High-temperature sintering: Densification treatment in an inert atmosphere at 2100℃

3. Surface modification: Nanoscale protective layers are formed through reactive ion etching (RIE). The latest research shows that the service life of silicon carbide edge rings doped with 3% boron is increased by 40%, and the wafer contamination rate is reduced to the 0.01ppm level

Application scenarios

It shows irreplaceability in processes below 5nm:

2. Etching uniformity: It can maintain an etching rate deviation of ±1.5% at the wafer edge

3. Pollution control: It reduces metal pollution by 92% compared with traditional quartz materials

4. Maintenance cycle: It can operate continuously for 1500 hours in CF4/O2 plasma


Veteksemicon have achieved a breakthrough in the domestic production of sic edge rings, which can save a lot of cost expenditures. Welcome to contact us at any time!


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