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Oxidation and Diffusion Furnace

Oxidation and Diffusion Furnaces are used in various fields such as semiconductor devices, discrete devices, optoelectronic devices, power electronic devices, solar cells, and large-scale integrated circuit manufacturing. They are utilized for processes including diffusion, oxidation, annealing, alloying, and sintering of wafers.


VeTek Semiconductor is a leading manufacturer specializing in the production of high-purity graphite, silicon carbide and quartz components in oxidation and diffusion furnaces. We are committed to providing high-quality furnace components for the semiconductor and photovoltaic industries, and are at the forefront of surface coating technology, such as CVD-SiC, CVD-TaC, pyrocarbon,etc.


The advantages of VeTek Semiconductor silicon carbide components:

● High temperature resistance (up to 1600℃)

● Excellent thermal conductivity and thermal stability

● Good chemical corrosion resistance

● Low coefficient of thermal expansion

● High strength and hardness

● Long service life


In oxidation and diffusion furnaces, due to the presence of high temperature and corrosive gases, many components require the use of high-temperature and corrosion-resistant materials, among which silicon carbide (SiC) is a commonly used choice. The following are common silicon carbide components found in oxidation furnaces and diffusion furnaces:



● Wafer Boat

Silicon carbide wafer boat is a container used to carry silicon wafers, which can withstand high temperatures and will not react with silicon wafers.


● Furnace Tube

The furnace tube is the core component of the diffusion furnace, used to accommodate silicon wafers and control the reaction environment. Silicon carbide furnace tubes have excellent high-temperature and corrosion resistance performance.


● Baffle Plate

Used to regulate the airflow and temperature distribution inside the furnace


● Thermocouple Protection Tube

Used to protect temperature measuring thermocouples from direct contact with corrosive gases.


● Cantilever Paddle

Silicon carbide cantilever paddles are resistant to high temperature and corrosion, and are used to transport silicon boats or quartz boats carrying silicon wafers into the diffusion furnace tubes.


● Gas Injector

Used to introduce reaction gas into the furnace, it needs to be resistant to high temperature and corrosion.


● Boat Carrier

Silicon carbide wafer boat carrier is used to fix and support silicon wafers, which have advantages such as high strength, corrosion resistance, and good structural stability.


● Furnace Door

Silicon carbide coatings or components may also be used on the inside of the furnace door.


● Heating Element

Silicon carbide heating elements are suitable for high temperatures, high power, and can quickly raise temperatures to over 1000℃.


● SiC Liner

Used to protect the inner wall of furnace tubes, it can help reduce the loss of heat energy and withstand harsh environments such as high temperature and high pressure.

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SiC Process Tube

SiC Process Tube

VeTek Semiconductor provides high-performance SiC Process Tubes for semiconductor manufacturing. Our SiC Process Tubes excel in oxidation, diffusion processes. With superior quality and craftsmanship, these tubes offer high-temperature stability and thermal conductivity for efficient semiconductor processing. We offer competitive pricing and seek to be your long-term partner in China.
SiC Cantilever Paddle

SiC Cantilever Paddle

VeTek Semiconductor's SiC Cantilever Paddle is used in heat treatment furnaces for handling and supporting wafer boats. The high temperature stability and high thermal conductivity of SiC material ensure high efficiency and reliability in the semiconductor processing process. We are committed to providing high-quality products at competitive prices and look forward to becoming your long-term partner in China.
Silicon Carbide Wafer Boat for Horizontal Furnace

Silicon Carbide Wafer Boat for Horizontal Furnace

SiC wafer boat has high requirement in material purity.Vetek Semiconductor supply SiC purity >99.96% recrystallized SiC to this product.VeTek Semiconductor is a professional manufacturer and supplier in China for silicon carbide wafer boat for horizontal furnace, with years of experience in R&D and production, can control the quality well and offer a competitive price. You can rest assured to buy the silicon carbide wafer boat for horizontal furnace from us.
SiC Coated Silicon Carbide Wafer Boat

SiC Coated Silicon Carbide Wafer Boat

SiC Coated Silicon Carbide Wafer Boat is designed with 165 slots to carry wafers.VeTek Semiconductor is professional manufacturer and supplier in China for SiC coated silicon carbide wafer boat, with years of experience in R&D and production, can control the quality well and offer a competitive price. Welcome for visiting our factory and have further discussion on cooperation.
Silicon Carbide Cantilever Paddle

Silicon Carbide Cantilever Paddle

VeTek Semiconductor's Silicon Carbide Cantilever Paddle is an important component in the semiconductor manufacturing process, especially suitable for diffusion furnaces or LPCVD furnaces in high-temperature processes such as diffusion and RTP. Our Silicon Carbide Cantilever Paddle is carefully designed and manufactured with excellent high-temperature resistance and mechanical strength, and can safely and reliably transport wafers to the process tube under harsh process conditions for various high-temperature processes such as diffusion and RTP. We look forward to becoming your long-term partner in China.Feel free to inquire us.
High Pure Silicon Carbide Wafer Carrier

High Pure Silicon Carbide Wafer Carrier

VeTek Semiconductor High Pure Silicon Carbide Wafer Carrier are important components in semiconductor processing, designed to safely hold and transport delicate silicon wafers, playing a key role in all stages of manufacturing. VeTek Semiconductor's High Pure Silicon Carbide Wafer Carrier are carefully designed and manufactured to ensure excellent performance and reliability. VeTek Semiconductor is committed to providing quality products at competitive prices, and we look forward to being your long-term partner in China.Feel free to inquire us.

Shop high-performance Oxidation and Diffusion Furnace components at Veteksemicon—your trusted source for SiC-based thermal process solutions.


Veteksemicon supplies premium-grade silicon carbide (SiC) components designed specifically for oxidation and diffusion furnace systems in semiconductor manufacturing. These SiC parts exhibit excellent thermal shock resistance, high mechanical strength, and long-term dimensional stability in ultra-high-temperature and oxidizing environments. Ideal for process temperatures exceeding 1200°C, they are widely used in atmospheric and low-pressure diffusion systems, oxidation furnaces, and vertical thermal reactors.


Our product portfolio includes SiC cantilevers, boats, support rods, and tube liners, all engineered for precise wafer positioning and minimal particle contamination. The low thermal expansion coefficient of SiC helps maintain alignment across thermal cycles, while its chemical inertness ensures compatibility with O₂, N₂, H₂, and dopant gases. Whether for dry oxidation or dopant diffusion (e.g., phosphorus or boron), Veteksemicon’s diffusion furnace solutions enhance process stability, extend maintenance intervals, and support 200mm/300mm wafer formats.


For technical drawings, material datasheets, or quotation support, please visit Veteksemicon’s Oxidation and Diffusion Furnace product page or contact our application engineers.


As a professional Oxidation and Diffusion Furnace manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Oxidation and Diffusion Furnace made in China, you can leave us a message.
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