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Solid Silicon Carbide Focusing Ring
  • Solid Silicon Carbide Focusing RingSolid Silicon Carbide Focusing Ring

Solid Silicon Carbide Focusing Ring

Veteksemicon Solid Silicon Carbide (SiC) Focusing Ring is a critical consumable component used in advanced semiconductor epitaxy and plasma etching processes, where precise control of plasma distribution, thermal uniformity, and wafer edge effects is essential. Manufactured from high-purity solid silicon carbide, this focusing ring exhibits exceptional plasma erosion resistance, high-temperature stability, and chemical inertness, enabling reliable performance under aggressive process conditions. We look forward to your inquiry.

The Veteksemicon Solid Silicon Carbide Focusing Ring is a pivotal component in semiconductor manufacturing, strategically positioned outside the wafer to maintain direct contact. By utilizing an applied voltage, this ring focuses the plasma traversing it, thereby enhancing the process uniformity on the wafer. Constructed solely from Chemical Vapor Deposition Silicon Carbide (CVD SiC), this focusing ring embodies the exceptional qualities demanded by the semiconductor industry. We at Veteksemicon are dedicated to manufacturing and supplying high-performance Solid Silicon Carbide Focusing Rings that fuse premium quality with cost-efficiency.


Product Advantages

Compared to traditional Silicon (Si) or Sintered Silicon Carbide (Sintered SiC) focus rings, our product excels in key dimensions:


Feature Dimension
Veteksemicon CVD SiC Focus Ring
Traditional Silicon (Si) Focus Ring
Sintered SiC Focus Ring
Plasma Etch Resistance
Exceptional (Consumption rate significantly lower than Si)
Poor (Rapid consumption, frequent replacement)
Moderate (Better than Si, but inferior to CVD SiC)
Particle Generation Control
Exceptional (Dense CVD structure, no fragile sidewall interfaces)
Controllable (But material consumption itself is a particle source)
Relatively Higher (Due to material porosity and potential micro-particles)
Conductivity & Electrical Matching
Excellent (Good electrical matching with wafer)
Good
Good
Thermal Management
Excellent (High thermal conductivity, low CTE, superior thermal shock resistance)
Moderate
Good
Mechanical Strength & Service Life
Exceptionally Long (High hardness, wear & corrosion resistance)
Short
Long
Total Cost of Ownership (TCO)
Lower (Ultra-long life reduces downtime for replacement and improves yield)
High
Moderate

Notably, silicon carbide’s conductivity and resistance to ion etching are closely akin to silicon, ensuring compatibility with existing semiconductor manufacturing processes while delivering enhanced performance—making the Veteksemicon Solid Silicon Carbide Focusing Ring an ideal material choice for this critical application.


The Veteksemicon Solid Silicon Carbide Focusing Ring stands as a state-of-the-art solution in the realm of semiconductor manufacturing. It fully leverages the unique material advantages of  CVD SiC to facilitate reliable, high-precision, and high-efficiency etching processes, significantly contributing to the advancement of next-generation semiconductor technology.


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