Products

The CVD SiC coated RTP susceptor from VeTek Semiconductor serves rapid thermal processing (RTP) and rapid thermal annealing (RTA) equipment used throughout semiconductor manufacturing. The substrate is machined from high‑purity isostatic graphite, over which a dense CVD silicon carbide (SiC) layer is deposited. This construction yields high thermal conductivity, robust chemical inertness, and sustained dimensional stability under repeated high‑temperature cycling.

For demanding semiconductor crystal growth applications, the VETEK three‑piece graphite crucible delivers the stability, purity, and thermal evenness that the process requires. Made from high‑grade isostatic graphite—with optional SiC, TaC, or PyC coatings—its split design isn’t just for convenience. It actively reduces thermal stress, makes maintenance faster, and keeps performing cycle after cycle.

The VETEK PG (Pyrolytic Graphite) Coated Ring is purpose-built for semiconductor thermal field and crystal growth environments where uniform heat distribution and stable temperatures are non-negotiable. Starting with a high-purity graphite base and finished with a dense Pyrolytic Graphite coating, this component delivers exceptional thermal conductivity, stands up to severe thermal shock, and retains its dimensions over long runs at extreme temperatures. You will find these rings used extensively in crystal growth furnaces, high-temperature ovens, and thermal field assemblies for semiconductors—anywhere that precise temperature control directly drives process repeatability and final product quality.

If you’ve ever dealt with uneven gas flow or particle contamination in a deposition chamber, the VETEK CVD SiC Coated Graphite Shower Head is designed to solve that. It starts with high‑purity isostatic graphite for thermal stability and easy machining, then gets a dense CVD Silicon Carbide (SiC) coating that seals the surface, resists corrosive gases (like HCl or NF₃), and prevents outgassing. The result is a gas distribution plate that delivers uniform flow across the wafer, handles high‑temperature epitaxy, and lasts far longer than bare graphite or quartz – making it a trusted component for CVD, PECVD, MOCVD, silicon epitaxy, and SiC epitaxy processes. We also offer custom hole patterns and sizes, because no two reactors are exactly the same.

VeTek Semiconductor High Purity Silicon Carbide (SiC) Powder is specially developed for SiC crystal growth, semiconductor materials, and advanced ceramic applications. Through advanced purification technology and strict quality control, our SiC powder offers ultra-low impurity levels, stable particle distribution, and excellent consistency for demanding manufacturing processes.

In SiC PVT crystal growth setups, graphite parts are run at very high temperatures for long periods. VeTek’s PyC coated graphite ring is built for that kind of duty. A pyrolytic carbon layer gets deposited onto high-purity graphite via CVD. This gives the part better surface stability and fewer particles coming off during operation. You usually put it in the thermal field area to help manage vapor flow and how heat spreads inside the furnace. The coating also slows down graphite sublimation when things go above 2200°C, which makes the whole component last longer.