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  • LPE SiC EPI Halfmoon

    LPE SiC EPI Halfmoon

    LPE SiC Epi Halfmoon is a special design for horizonational epitaxy furnace, a revolutionary product designed to elevate LPE reactor SiC epitaxy processes. This cutting-edge solution boasts several key features that ensure superior performance and efficiency throughout your manufacturing operations.Vetek Semiconductor is professional at manufacturing LPE SiC Epi halfmoon in 6 inch,8inch.Looking forward to setting up long term cooperation with you.
  • MOCVD LED Epi Susceptor

    MOCVD LED Epi Susceptor

    VeTek Semiconductor is a professional manufacturer of MOCVD LED Epi Susceptor in China. our MOCVD LED Epi Susceptor is designed for demanding epitaxial equipment applications. Its high thermal conductivity, chemical stability and durability are key factors to ensure a stable epitaxial growth process and semiconductor film production.
  • CMP Polishing Slurry

    CMP Polishing Slurry

    CMP polishing slurry (Chemical Mechanical Polishing Slurry) is a high-performance material used in semiconductor manufacturing and precision material processing. Its core function is to achieve fine flatness and polishing of the material surface under the synergistic effect of chemical corrosion and mechanical grinding to meet the flatness and surface quality requirements at the nano level. Looking forward to your further consultation.
  • Semiconductor quartz screen

    Semiconductor quartz screen

    Veteksemicon Semiconductor Quartz Screen is a vital component in Metal-Organic Chemical Vapor Deposition (MOCVD) systems, playing a crucial role in optimizing thin film growth processes. This product detail page highlights Veteksemicon's high-purity quartz screens, designed to enhance the uniformity, purity, and maintenance efficiency of MOCVD equipment.
  • Wafer Chuck

    Wafer Chuck

    Wafer chunk a wafer clamping tool in semiconductor process and is widely used in PVD, CVD, ETCH and other process.Vetek Semiconductor's wafer chuck play pivotal roles in semiconductor production, enabling fast, high-quality output. With in-house manufacturing, competitive pricing, and robust R&D support, Vetek Semiconductor excels in OEM/ODM services for precision components.Looking forward to your inquiry.
  • CVD SiC coating rigid felt

    CVD SiC coating rigid felt

    As an important part of the SiC coating halfmoon graphite parts, CVD SiC coating rigid felt plays an important role in heat preservation during the SiC epitaxial growth process. VeTek Semiconductor is a mature CVD SiC coating rigid felt manufacturer and supplier, which can provide customers with suitable and excellent CVD SiC coating rigid felt products. VeTek Semiconductor looks forward to becoming your long-term partner in the epitaxial industry.

  • What is semiconductor epitaxy process?

    It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

  • What are the differences between Isotropic Graphite and Siliconized Graphite?

    Graphite materials have a wide range of application scenarios. Among them, Isotropic Graphite and Siliconized Graphite are the two main different types of graphite materials, and their characteristics, application scenarios and advantages are significantly different. This blog will conduct a comparative analysis from three aspects: structural characteristics, application scenarios and product advantages.

  • Welcome Customers to Visit Veteksemicon's Carbon Fiber Products Factory

    On September 5, 2025, a customer from Poland visited a factory under VETEK to learn about our advanced technologies and innovative processes in the production of carbon fiber products.

  • What’s the specific application of TaC coated parts in the semiconductor field?

    Tantalum carbide (TaC) coatings are widely used in the semiconductor field, mainly for epitaxial growth reactor components, single crystal growth key components, high-temperature industrial components, MOCVD system heaters and wafer carriers.Its excellent high temperature resistance and corrosion resistance can improve equipment durability, yield and crystal quality, reduce energy consumption and improve stability.

  • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

    SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

  • 8-inch SiC epitaxial furnace and homoepitaxial process research

    8-inch SiC epitaxial furnace and homoepitaxial process research

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