CVD SiC Coated RTP Susceptor

Features

• Thermal Uniformity – The material’s high thermal diffusivity enables rapid, spatially uniform heat transfer, supporting repeatable wafer temperature profiles.
• High Purity Level – The CVD SiC coating achieves a purity of 99.99995%, effectively reducing mobile ion and metal contamination risks in critical process steps.
• Chemial Durability – The coating exhibits strong resistance to corrosive species, including halogen‑based gases, under elevated temperatures.l Extened Service Intervals – Enhanced oxidation and wear resistance translate to fewer replacements and reduced tool downtime.
• Design Flexibility – Dimensions and configurations can be adapted to match specific RTP chamber geometries and wafer sizes.

Applications

• Rapid Thermal Processing (RTP)
• Rapid Thermal Annealing (RTA)
• Dopant activationl Oxidation and annealing steps
• Integrated circuit (IC) manufacturing
• Power device fabricationTechnical

Specifications

Why Choose VeTek Semiconductor?

· In‑house CVD SiC coating process developed specifically for semiconductor‑grade requirements.

· Integrated capabilities for graphite purification, precision machining, and coating thickness control.

· Proven coating adhesion and layer uniformity across batch production.

· Engineering support for custom susceptor designs compatible with major RTP tool platforms.

· Rigorous incoming material inspection, in‑process monitoring, and final qualification testing ensure batch‑to‑batch consistency.